Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-04-15
著者
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Shindo H
Samsung Yokohama Res. Inst. Yokohama Jpn
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Shindo Haruo
Faculty of Agriculture, Yamaguchi University
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Horiike Yasuhiro
Faculty of Engineering, Toyo University
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HASHIMOTO Tetsuro
Faculty of Engineering, Hiroshima University
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Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Hashimoto T
Department Of Chemistry For Materials Faculty Of Engineering Mie University
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堀池 靖浩
広島大工
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Shindo Haruo
Faculty Of Agriculture Nagoya University
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