Emissive Probe Study of CF_4/H_2 Etching Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-03-15
著者
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Shindo Haruo
Faculty of Agriculture, Yamaguchi University
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Horiike Yasuhiro
Faculty of Engineering, Toyo University
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Horiike Yasuhiro
National Inst. For Materials Sci. Ibaraki Jpn
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Horiike Yasuhiro
Biomaterials Center National Institute For Materials Science
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Shindo Haruo
Faculty Of Agriculture Nagoya University : (present Address) Faculty Of Agriculture Yamaguchi Univer
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KONISHI Masayoshi
Faculty of Engineering, Hiroshima University
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Konishi Masayoshi
Faculty Of Engineering Hiroshima University:(present Address)mitsubishi Heavy Industry
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Shindo Haruo
Faculty Of Agriculture Nagoya University
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Horiike Yasuhiro
Development Of Material Science School Of Engineering University Of Tokyo
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Horiike Yasuhiro
World Premier International (wpi) Research Center Initiative International Center For Materials Nano
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- PREFACE
- Application of Photoexcited Reaction to VLSI Process (Special Issue on Opto-Electronics and LSI)
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- One-Chip Integration of Rapid Diagnosis Infectious-Disease Chip Based on New Phenomena of DNA Trap and Denature in Nanogaps
- Integrated DNA Purification and Detection Device for Diagnosis of Infectious Disease
- In Vivo Batteryless Wireless Communication System for Bio-MEMS Sensors
- Fabrication and Characterization of Quartz Nanopillars for DNA Separation by Size