Integrated DNA Purification and Detection Device for Diagnosis of Infection Diseases
スポンサーリンク
概要
- 論文の詳細を見る
- 2006-09-13
著者
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
National Inst. For Materials Sci. Ibaraki Jpn
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Horiike Yasuhiro
Biomaterials Center National Institute For Materials Science
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HASHIOKA Shingi
National Institute for Materials Science, Nanotech-driven Materials Research for Information Technol
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OGAWA Ryo
National Institute for Materials Science, Nanotech-driven Materials Research for Information Technol
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OGAWA Hiroki
National Institute for Materials Science, Nanotech-driven Materials Research for Information Technol
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Ogawa Ryo
National Institute For Materials Scienc
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Ogawa Hiroki
National Institute For Materials Science Nanotech-driven Materials Research For Information Technolo
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Horiike Yasuhiro
Development Of Material Science School Of Engineering University Of Tokyo
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Horiike Yasuhiro
World Premier International (wpi) Research Center Initiative International Center For Materials Nano
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Hashioka Shingi
National Institute For Materials Scienc
関連論文
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- ラジアルラインスロットアンテナを用いたプラズマエッチング装置
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- 極微量全血分離・分析を目指したヘルスケアチップの創製
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
- 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析
- カーボンナノチューブフィールドエミッターのI-V特性と先端構造
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Floating Potential in Negative-Ion-Containing Plasma
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
- A Study on Mechanism of Chemical Mechanical Polishing on Al and Cu Surfaces Employing In-situ Infrared Spectroscopy
- 水素+水蒸気プラズマダウンフローへのNF_3添加によるシリコン表面の自然酸化膜除去
- テトラフルオロエチルトリフルオロメチルエーテル(HFE 227)への有機シラン添加による高選択比・高アスペクト比酸化膜エッチング
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- 2.4GHzフロントエンドAlN/α-Al_2O_3 SAWマッチトフィルタ
- 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
- 日々の健康管理 -ヘルスケアデバイスの創製-
- プラズマプロセスによるバイオチップの開発と展望
- 大気圧マイクロプラズマジェットの微細加工への応用
- VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用
- 高アスペクト比ULSIエッチング技術
- 5.最近のトピックス : 5.2フッ素,塩素負イオン生成とSi,SiO_2とのエッチング反応 : 負イオンを見直そう(負イオン特集)
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- 負イオンプラズマによるシリコンエッチング
- 4. 高密度RFプラズマによる高速・高選択比SiO_2エッチングと反応機構 (ドライエッチング用プラズマ)
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
- Sheath Width in Negative-Ion-Containing Plasma
- Emissive Probe Study of CF_4/H_2 Etching Plasma
- 容量結合型大気圧マイクロプラズマ源
- 医療
- Integrated DNA Purification and Detection Device for Diagnosis of Infection Diseases
- DNA Size Separation Employing Quartz Nano-Pillars with Different Allocations
- Development of Clinical Chips for Home Medical Diagnostics
- 在宅で健康診断できるヘルスケアチップの開発 (特集 診断バイオチップの未来)
- μ-TAS応用によるバイオセンサ式ヘルスケアチップ (特集 流体MEMSのすべて--マイクロ流体デバイスの応用展開とその実用化)
- 産学独連携により2009年115WのEUV光源を実現
- 無痛針採血による在宅健康診断チップ
- 医療用バイオチップの現状と将来展望
- B-5-145 in vivoワイヤレス通信チップ用送受信回路に関する研究(B-5.無線通信システムA(移動通信))
- B-1-16 in vivo ワイヤレス通信チップ用アンテナに関する研究 : 電磁波の人体透過特性
- RF Attenuation Characteristics for In Vivo Wireless Healthcare Chip
- in-vivo Wireless Communication System for Bio MEMS Sensors
- One-Chip Integration of the Rapid Diagnosis Infectious Disease Chip Based on New Phenomena of DNA Trap and Denature in Nano-Gaps
- In Vivo Batteryless Wireless Communication System for Bio-MEMS Sensors
- Damage-Free Flattening Technology of Large Scale Si Wafer Employing Localized SF6/H2 Downstream Plasma
- Reactive Ion Beam Etching of SiO_2 and Poly-Si Employing C_2F_6, SiF_4 and BF_3 Gases
- Resistance Oscillations Induced by Direct Current Electromigration
- High-Rate Bias Sputtering Filling of SiO2 Film Employing Both Continuous Wave and Time-Modulated Inductively Coupled Plasmas
- Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass Chips Using Deep Dry Etching and Anodic Bonding
- Grafting Poly(ethylene glycol) to a Glass Surface via a Photocleavable Linker for Light-induced Cell Micropatterning and Cell Proliferation Control
- KrF Excimer Laser Projection Lithography: 0.35μm Minimum Space VLSI Pattern Fabrication by a Tri-Level Resist Process
- 新しい装置創りから未知なるものの発見
- ULSI高アスペクト比SiO_2エッチング技術の現状と展望
- ナノ構造体を用いた無標識検出
- 表面反応研究のより一層の促進を
- 高密度プラズマによるエッチングプロセス(最新のプラズマプロセス技術)
- Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
- Gas Residence Time Effects on Plasma Parameters: Comparison between Ar and C4F8
- Droplet device for immunoassay detection
- Ethnic Identity and Social Interaction : A Reflection on Fulbe Identity
- Foreign Workers in Cities : A Comparison of Paris and Osaka
- Bodilessness and Incongruity : Body Image and Its Social Dynamics among the Fulbe of Senegal
- Some Problems Concerning Personal Names
- Si and SiO_2 Etching Characteristics Using Reactive Ion Etching with CF_4-Cl_2 Gas Mixture
- A Portable Biochemical Analysis System Integrated with Microcapillary Electrophoresis and Microplasma Emission Spectroscopy
- PREFACE
- Application of Photoexcited Reaction to VLSI Process (Special Issue on Opto-Electronics and LSI)
- Si and SiO_2 Etching Characteristics by Fluorocarbon Ion Beam
- Healthcare Chip Based on Integrated Electrochemical Sensors Used for Clinical Diagnostics of Bun
- One-Chip Integration of Rapid Diagnosis Infectious-Disease Chip Based on New Phenomena of DNA Trap and Denature in Nanogaps
- Integrated DNA Purification and Detection Device for Diagnosis of Infectious Disease
- In Vivo Batteryless Wireless Communication System for Bio-MEMS Sensors
- Fabrication and Characterization of Quartz Nanopillars for DNA Separation by Size