A Portable Biochemical Analysis System Integrated with Microcapillary Electrophoresis and Microplasma Emission Spectroscopy
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概要
- 論文の詳細を見る
- 2001-09-25
著者
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
National Inst. For Materials Sci. Ibaraki Jpn
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Horiike Yasuhiro
Biomaterials Center National Institute For Materials Science
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Ichiki Takanori
Bio-nano Electronics Research Center Toyo University
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Horiike Yasuhiro
Development Of Material Science School Of Engineering University Of Tokyo
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Horiike Yasuhiro
World Premier International (wpi) Research Center Initiative International Center For Materials Nano
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KOIDESAWA Toru
Bio-Nano Electronics Research Center, Toyo University
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WATANABE Masahiko
Bio-Nano Electronics Research Center, Toyo University
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UJIIE Tatekazu
Bio-Nano Electronics Research Center, Toyo University
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Koidesawa Toru
Bio-nano Electronics Research Center Toyo University
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Ujiie Tatekazu
Bio-nano Electronics Research Center Toyo University
関連論文
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- 極微量全血分離・分析を目指したヘルスケアチップの創製
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
- 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析
- カーボンナノチューブフィールドエミッターのI-V特性と先端構造
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Floating Potential in Negative-Ion-Containing Plasma
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
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- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
- プラズマプロセスによるバイオチップの開発と展望
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- VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用
- An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample
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- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
- Atomic Layer Controlled Digital Etching of Silicon
- Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Sheath Width in Negative-Ion-Containing Plasma
- Emissive Probe Study of CF_4/H_2 Etching Plasma
- Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
- 容量結合型大気圧マイクロプラズマ源
- 医療
- Integrated DNA Purification and Detection Device for Diagnosis of Infection Diseases
- DNA Size Separation Employing Quartz Nano-Pillars with Different Allocations
- Development of Clinical Chips for Home Medical Diagnostics
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- μ-TAS応用によるバイオセンサ式ヘルスケアチップ (特集 流体MEMSのすべて--マイクロ流体デバイスの応用展開とその実用化)
- 産学独連携により2009年115WのEUV光源を実現
- 無痛針採血による在宅健康診断チップ
- 医療用バイオチップの現状と将来展望
- B-5-145 in vivoワイヤレス通信チップ用送受信回路に関する研究(B-5.無線通信システムA(移動通信))
- B-1-16 in vivo ワイヤレス通信チップ用アンテナに関する研究 : 電磁波の人体透過特性
- RF Attenuation Characteristics for In Vivo Wireless Healthcare Chip
- in-vivo Wireless Communication System for Bio MEMS Sensors
- One-Chip Integration of the Rapid Diagnosis Infectious Disease Chip Based on New Phenomena of DNA Trap and Denature in Nano-Gaps
- Numerically Controlled Dry Etching Technology for Flattening of Si Wafer which Employs SF_6/H_2 Downstream Plasma
- Damage-Free Flattening Technology of Large Scale Si Wafer Employing Localized SF6/H2 Downstream Plasma
- Reactive Ion Beam Etching of SiO_2 and Poly-Si Employing C_2F_6, SiF_4 and BF_3 Gases
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology
- Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement
- Characteristics of Very High-Aspect-Ratio Contact Hole Etching
- Photoexcited Anisotropic Etching of Single-Crystalline Silicon
- High-Rate Bias Sputtering Filling of SiO2 Film Employing Both Continuous Wave and Time-Modulated Inductively Coupled Plasmas
- Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass Chips Using Deep Dry Etching and Anodic Bonding
- Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets
- Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
- Grafting Poly(ethylene glycol) to a Glass Surface via a Photocleavable Linker for Light-induced Cell Micropatterning and Cell Proliferation Control
- KrF Excimer Laser Projection Lithography: 0.35μm Minimum Space VLSI Pattern Fabrication by a Tri-Level Resist Process
- ナノ構造体を用いた無標識検出
- Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
- Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field
- Gas Residence Time Effects on Plasma Parameters: Comparison between Ar and C4F8
- Capacitively Coupled Microplasma Source on a Chip at Atmospheric Pressure : Nuclear Science, Plasmas, and Electric Discharges
- Droplet device for immunoassay detection
- Si and SiO_2 Etching Characteristics Using Reactive Ion Etching with CF_4-Cl_2 Gas Mixture
- Digital Chemical Vapor Deposition of SiO_2 Using a Repetitive Reaction of Triethylsilane/Hydrogen and Oxidation
- A Portable Biochemical Analysis System Integrated with Microcapillary Electrophoresis and Microplasma Emission Spectroscopy
- PREFACE
- Application of Photoexcited Reaction to VLSI Process (Special Issue on Opto-Electronics and LSI)
- Si and SiO_2 Etching Characteristics by Fluorocarbon Ion Beam
- Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma
- Healthcare Chip Based on Integrated Electrochemical Sensors Used for Clinical Diagnostics of Bun
- Biochip Which Examines Hepatic Function by Employing Colorimetric Method
- Mechanism of Cloudy Surface Generation on Si Wafer Employing Numerically Controlled Local Dry Etching (NC-LDE)
- Initiation of the Planarization of SiO2 Film Employing Anhydrous HF Gas
- One-Chip Integration of Rapid Diagnosis Infectious-Disease Chip Based on New Phenomena of DNA Trap and Denature in Nanogaps
- A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
- Study on the Mechanism of Silicon Chemical Mechanical Polishing Employing In Situ Infrared Spectroscopy
- Heliconwave Plasma Which Contains Negative Ion
- Generation of Integrated Atmospheric-Pressure Microplasmas
- Study on the Mechanisms of Chemical Mechanical Polishing on Copper and Aluminum Surfaces Employing In Situ Infrared Spectroscopy
- Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge