PREFACE

スポンサーリンク

概要

• 論文の詳細を見る
• 2001-09-25

著者

• Horiike Yasuhiro

  National Inst. For Materials Sci. Ibaraki Jpn

• Horiike Yasuhiro

  Biomaterials Center National Institute For Materials Science

• Horiike Yasuhiro

  Development Of Material Science School Of Engineering University Of Tokyo

• Horiike Yasuhiro

  World Premier International (wpi) Research Center Initiative International Center For Materials Nano

• HORIIKE Yasuhiro

  The University of Tokyo

関連論文

• Floating Potential in Negative-Ion-Containing Plasma
• A Study on Mechanism of Chemical Mechanical Polishing on Al and Cu Surfaces Employing In-situ Infrared Spectroscopy
• In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
• Selective Processing of Individual Carbon-Nanotubes Using Atomic Force Microscopy Installed in Transmission Electron Microscope
• Sheath Width in Negative-Ion-Containing Plasma
• Emissive Probe Study of CF_4/H_2 Etching Plasma
• Integrated DNA Purification and Detection Device for Diagnosis of Infection Diseases
• DNA Size Separation Employing Quartz Nano-Pillars with Different Allocations
• Development of Clinical Chips for Home Medical Diagnostics
• RF Attenuation Characteristics for In Vivo Wireless Healthcare Chip
• in-vivo Wireless Communication System for Bio MEMS Sensors
• One-Chip Integration of the Rapid Diagnosis Infectious Disease Chip Based on New Phenomena of DNA Trap and Denature in Nano-Gaps
• In Vivo Batteryless Wireless Communication System for Bio-MEMS Sensors
• Damage-Free Flattening Technology of Large Scale Si Wafer Employing Localized SF6/H2 Downstream Plasma
• Reactive Ion Beam Etching of SiO_2 and Poly-Si Employing C_2F_6, SiF_4 and BF_3 Gases
• Grafting Poly(ethylene glycol) to a Glass Surface via a Photocleavable Linker for Light-induced Cell Micropatterning and Cell Proliferation Control
• KrF Excimer Laser Projection Lithography: 0.35μm Minimum Space VLSI Pattern Fabrication by a Tri-Level Resist Process
• Gas Residence Time Effects on Plasma Parameters: Comparison between Ar and C4F8
• Droplet device for immunoassay detection
• Si and SiO_2 Etching Characteristics Using Reactive Ion Etching with CF_4-Cl_2 Gas Mixture
• A Portable Biochemical Analysis System Integrated with Microcapillary Electrophoresis and Microplasma Emission Spectroscopy
• PREFACE
• Application of Photoexcited Reaction to VLSI Process (Special Issue on Opto-Electronics and LSI)
• Si and SiO_2 Etching Characteristics by Fluorocarbon Ion Beam
• Healthcare Chip Based on Integrated Electrochemical Sensors Used for Clinical Diagnostics of Bun
• One-Chip Integration of Rapid Diagnosis Infectious-Disease Chip Based on New Phenomena of DNA Trap and Denature in Nanogaps
• Integrated DNA Purification and Detection Device for Diagnosis of Infectious Disease
• In Vivo Batteryless Wireless Communication System for Bio-MEMS Sensors
• Fabrication and Characterization of Quartz Nanopillars for DNA Separation by Size

もっと見る 閉じる

スポンサーリンク