Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-12-30

著者

• Shindo Haruo

  Department Of Applied Physics Tokai University

• Shindo H

  Samsung Yokohama Res. Inst. Yokohama Jpn

• HORIIKE Yasuhiro

  Department of Electrical Engineering, Toyo University

• NARAI Akira

  Department of Electrical Engineering, Hiroshima University

• SAKAUE Hiroyuki

  Department of Electrical Engineering, Hiroshima University

• KOTO Makoto

  Department of Electrical Engineering, Hiroshima University

• Koto Makoto

  Department Of Electrical Engineering Hiroshima University

• Nakamura A

  Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University

• SAKAUE Hiroyuki

  Graduate School of Advanced Sciences of Matter, Hiroshima University

• Shindo H

  Department Of Electronics Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Department Of Electrical & Electronics Engineering Tokyo University

• Horiike Yasuhiro

  Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Department Of Electrical Engineering Toyo University

• Narai Akira

  Faculty Of Engineering Hiroshima University

• 堀池 靖浩

  広島大工

• Sakaue H

  Hiroshima University Graduate School Of Adsm

• Sakaue Hiroyuki

  Department Of Electrical Engineering Hiroshima University

• Shindo Haruo

  Department Of Applied Physics

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