Nakamura A | Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University

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著作論文

RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
RF Self-Bias Characteristics in Inductively Coupled Plasma
Al Etching Characteristics Ernploying Helicon Wave Plasma
Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
Indonesian Medicinal Plants. XX. Chemical Structures of Eleuthosides A, B, and C, Three New Aromatic Glucosides from the Bulbs of Eleutherine palmifolia (Iridaceae)
SEARCH FOR NATURAL AND SYNTHETIC IONOPHORES : EXPLOITATION OF NEW METHODS FOR MEASUREMENT OF ION-TRANSPORT AND ION-BINDING ACTIVITIES AND ION-PERMEABILITY
0.13μm Metal-Oxide-Nitride-Oxide-Semiconductor Single Transistor Memory Cell with Separated Source Line
Analysis of Carrier Traps in Si_3N_4N_4 in Oxide/Nitride/Oxide for Metal/Oxide/Nitride/Oxide/Silicon Nonvolatile Memory
Development of Sub-Quarter-μm MONOS (metal/oxide/nitride/oxide/semiconductor)Type Memory Transistor
Development of Sub-Quarter-μm MONOS Type Memory Transistor

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