Shindo Haruo | Department Of Applied Physics

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概要

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著作論文

Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
Production of Large-Diameter Microwave Plasma with a High-Permittivity Material Window
Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
Deep dry etching of quartz plate over 100μm in depth for the fabrication of high performance analytical chip(ABSTRACTS OF PROCEEDINGS OF THE SCHOOL OF INFORMATION TECHNOLOGY AND ELECTRONICS SERIES J TOKAI UNIVERSITY -2003-2004-)
Mode Transition Enhancement by Permittivity of Window Materials in Low Frequency Plasmas
Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
Kinetic Treatment of Self-Reversal in Reversed Field Pinch Plasma
Fabrication of AlN/Al_2O_3 GHz Band SAW Filter and Simulation Analysis
Establishment of Saha-Boltzmann Equilibrium for ArI Lower Excited Atoms in a Wall-Confined Arc Plasma
Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
Silicon Etching Employing Negative Ion in SF_6 Plasma
Warming Potential Reduction of C_4F_8 Using Inductively Coupled Plasma
Laser-Induced Fluorescence Study of Penning Collision of Hel 2^1S Atom with Xe in He+Xe Gas Discharge Plasma : Waves, Optics and Quantum Electronics
A Study of Capacitively Coupled Plasma Generation in Single-Loop Antennas : Nuclear Science, Plasmas, and Electric Discharges
A New Method of Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide
Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field
Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma
In Situ Measurements of Etching Species in SF6 Microwave Downstream Plasma by Ion Attachment Mass Spectroscopy
Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
Heliconwave Plasma Which Contains Negative Ion
Long Line-Shaped Microwave Plasma Generation Employing a Narrow Rectangular Waveguide
Warming Potential Reduction of C4F8 Using Inductively Coupled Plasma
Optimum Frequency for Inductively Coupled Plasma Generation with a Single-Loop Antenna
New Emissive Probe Measurements of Electron Temperature in Two Modes of Radio-Frequency Plasmas
Silicon Trench Oxidation in Downstream of Microwave Oxygen Plasma

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