Warming Potential Reduction of C4F8 Using Inductively Coupled Plasma
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概要
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The global warming potential (GWP) reduction of the perfluorinated compound (PFC) semiconductor manufacturing gas, C4F8, has been studied in an inductively coupled high-frequency (13.56 MHz) plasma system operating under multimode antenna. Mass spectral analysis of the decomposed species showed that major ionic species in the present study were (CF$_{x}^{+}$ ($x=1,3$) and C2F$_{4}^{+}$). Weak signals of CF$_{4}^{+}$ ions were detected for the first time in a C4F8 plasma. The behavior of the CF$_{4}^{+}$, C2F$_{4}^{+}$ and CF$_{3}^{+}$ ion peaks at various gas pressures (1–50 mTorr) and the effect of additive oxygen on the decomposition of the parent gas and CF4 have been presented. The mechanism of electron energy control was proposed for the effective decomposition of the C4F8 gas. The overall results showed that, at a higher azimuthal mode of antenna ($m=1$) the C4F8 decomposition and its GWP reduction was significant and it was considered to be due to the electron energy control at that mode.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-01-15
著者
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Kudo Daisuke
Department Of Electronics Tokai University
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Raju Ramasamy
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Kubo Yuya
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Inaba Tsuginori
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Shindo Haruo
Department Of Applied Physics
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Raju Ramasamy
High-Tech Plasma Research Center, Institute of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan
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Kudo Daisuke
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka 259-1292, Japan
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Inaba Tsuginori
High-Tech Plasma Research Center, Institute of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan
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