Warming Potential Reduction of C_4F_8 Using Inductively Coupled Plasma
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-01-15
著者
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Shindo Haruo
Department Of Applied Physics Tokai University
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KUDO DAISUKE
Department of Surgery, Hirosaki University School of Medicine
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Kudo Daisuke
Department Of Electronics Tokai University
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Raju Ramasamy
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Shindo H
Department Of Electronics Tokai University
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KUBO Yuya
High-Tech Plasma Research Center, Institute of Science and Engineering, Chuo University
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INABA Tsuginori
High-Tech Plasma Research Center, Institute of Science and Engineering, Chuo University
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Kubo Yuya
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Inaba Tsuginori
High-tech Plasma Research Center Institute Of Science And Engineering Chuo University
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Shindo Haruo
Department Of Applied Physics
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