Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-12-15
著者
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Shindo Haruo
Department Of Applied Physics Tokai University
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Shindo Haruo
Department Of Electronics Tokai University
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FUJIWARA Kazuya
Department of Electronics, Tokai University
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YANAGISAWA Michihiko
Research & Development Division, Speedfam Co., Ltd.
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OKUYA Tadayoshi
Research & Development Division, Speedfam CO., LTD.
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Shindo H
Optical Laboratory Samsung Yokohama Research Institute
関連論文
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- Long Line-Shaped Microwave Plasma Generation Employing a Narrow Rectangular Waveguide
- Deep dry etching of quartz plate over 100μm in depth for the fabrication of high performance analytical chip(ABSTRACTS OF PROCEEDINGS OF THE SCHOOL OF INFORMATION TECHNOLOGY AND ELECTRONICS SERIES J TOKAI UNIVERSITY -2003-2004-)
- Mode Transition Enhancement by Permittivity of Window Materials in Low Frequency Plasmas