YANAGISAWA Michihiko | Research & Development Division, Speedfam Co., Ltd.
スポンサーリンク
概要
関連著者
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YANAGISAWA Michihiko
Research & Development Division, Speedfam Co., Ltd.
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Shindo Haruo
Department Of Applied Physics Tokai University
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Shindo Haruo
Department Of Electronics Tokai University
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FUJIWARA Kazuya
Department of Electronics, Tokai University
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OKUYA Tadayoshi
Research & Development Division, Speedfam CO., LTD.
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Shindo H
Optical Laboratory Samsung Yokohama Research Institute
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Fujiwara Kazuya
Department Of Electronics Tokai University
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Shindo Haruo
Department Of Applied Physics
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ENDO Masakatsu
Department of Electronics, Tokai University
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IKEDA Yasushi
Structural Ceramic Division, Kyocera Co., Ltd.
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SUZUKI Tsutomu
Semiconductor Division, Mitsumi Electric Co., Ltd.
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Endo Masakatsu
Department Of Electronics Tokai University
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Yanagisawa Michihiko
Research & Development Division Speedfam Co. Ltd.
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Ikeda Yasushi
Structural Ceramic Division Kyocera Co. Ltd.
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Suzuki Tsutomu
Semiconductor Division Mitsumi Electric Co. Ltd.
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Yanagisawa Michihiko
Research & Development Division, Speedfam CO., LTD., 2647 Hayakawa, Ayase 252-1123, Japan
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Okuya Tadayoshi
Research & Development Division, Speedfam CO., LTD., 2647 Hayakawa, Ayase 252-1123, Japan
著作論文
- Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing