Shindo Haruo | Department Of Electronics Tokai University
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概要
関連著者
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Shindo Haruo
Department Of Applied Physics Tokai University
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Shindo Haruo
Department Of Electronics Tokai University
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Shindo Haruo
Department Of Applied Physics
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FUJIWARA Kazuya
Department of Electronics, Tokai University
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YANAGISAWA Michihiko
Research & Development Division, Speedfam Co., Ltd.
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Shindo H
Optical Laboratory Samsung Yokohama Research Institute
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FURUKAWA Masakazu
Aries Research Group
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KUDO DAISUKE
Department of Surgery, Hirosaki University School of Medicine
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Kudo Daisuke
Department Of Electronics Tokai University
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FUJII Syuitsu
ADTEC Co., Ltd.
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Fujii Syuitsu
Adtec Co. Ltd.
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Fujii Syuitsu
Adtec Plasma Technology Co. Ltd.
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ENDO Masakatsu
Department of Electronics, Tokai University
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IKEDA Yasushi
Structural Ceramic Division, Kyocera Co., Ltd.
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SUZUKI Tsutomu
Semiconductor Division, Mitsumi Electric Co., Ltd.
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OKUYA Tadayoshi
Research & Development Division, Speedfam CO., LTD.
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Endo Masakatsu
Department Of Electronics Tokai University
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Furukawa Masakazu
Aries Research Inc.
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Kimura Yasuhito
Department of Electronics, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1259, Japan
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Kawaguchi Hideki
Muroran Institute of Technology, 27-1 Mizumoto-cho, Muroran, Hokkaido 050-8585, Japan
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Kagami Shin
Muroran Institute of Technology, 27-1 Mizumoto-cho, Muroran, Hokkaido 050-8585, Japan
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Fujiwara Kazuya
Department Of Electronics Tokai University
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Yanagisawa Michihiko
Research & Development Division Speedfam Co. Ltd.
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Kagami Shin
Muroran Institute Of Technology
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Kawaguchi Hideki
Muroran Institute Of Technology
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Kimura Yasuhito
Department Of Electronics Tokai University
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Ikeda Yasushi
Structural Ceramic Division Kyocera Co. Ltd.
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Suzuki Tsutomu
Semiconductor Division Mitsumi Electric Co. Ltd.
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Kudo Daisuke
Department of Electronics, Tokai University
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SHINDO Haruo
Department of Electronics, Tokai University
著作論文
- Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- A Study of Capacitively Coupled Plasma Generation in Single-Loop Antennas : Nuclear Science, Plasmas, and Electric Discharges
- A New Method of Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide