Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-01
著者
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Furukawa M
Canon Sales Co. Ltd. Tokyo Jpn
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Furukawa M
Process Equipment Engineering Div. Canon Sales Co. Inc.:(present)utsunomiya Optical Products Operati
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Furukawa Masakazu
Semiconductor Engineering Laboratory Pioneer Electronics Co.
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KUSABA Kouta
Department of Applied Physics, Tokai University
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SHINDO Haruo
Department of Applied Physics, Tokai University
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FURUKAWA Masakazu
Process Equipment Engineering Div., Canon Sales Co., Inc.
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SINAGAWA Keisuke
Process Equipment Division, Canon Sales Corporation
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KAWAMURA Katsufumi
Process Equipment Division, Canon Sales Corporation
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Kajiyama K
Ion Engineering Res. Inst. Co. Osaka Jpn
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Shindo H
Tokai Univ. Hiratsuka Jpn
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Shindo H
Yamaguchi Univ. Yamaguchi Jpn
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Shindo Haruo
Department Of Applied Physics Tokai University
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SHINAGAWA Keisuke
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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FURUKAWA Masakazu
Aries Research Group
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Kawamura K
Process Equipment Division Canon Sales Corporation
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Shinagawa K
Canon Sales Co. Inc. Tokyo Jpn
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Shinagawa Keisuke
Process Equipment Engineering Div. Canon Sales Co. Inc.
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Kusaba K
Tohoku Univ. Miyagi Jpn
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Kusaba Kouta
Department Of Applied Physics Tokai University
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Furukawa Masakazu
Process Equipment Engineering Div. Cannon Sales Co. Inc.
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Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
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Kawamura Katsufumi
Process Equipment Division Canon Sales Corporation
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Kawamura Ken-ichi
Hosono Transparent Electro-active Materials (team) Project Erato Japan Science And Technology Corpor
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Kawamura K
Keio Univ. Yokohama
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Kawamura K
Nihon Univ. Tokyo Jpn
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Shindo Haruo
Department Of Applied Physics
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