Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-06-15
著者
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Kajiyama K
Ion Engineering Res. Inst. Co. Osaka Jpn
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Kawamura K
Process Equipment Division Canon Sales Corporation
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Hayashi Shun-ichi
Advanced Materials And Technology Laboratories Nippon Steel Corporation
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Hayashi Shun-ichi
Advanced Materials & Technology Research Laboratories Nippon Steel Corporation
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Hamaguchi I
Advanced Technology Research Laboratories Nippon Steel Corporation
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Yano Takayuki
Advanced Technology Research Laboratories Nippon Steel Corporation:(present Address)technical Develo
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KAJIYAMA Kenji
Electrical Communication Laboratories
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HAMAGUCHI Isao
Electronics Research Laboratories, Nippon Steel Corp.
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YANO Takayuki
Electronics Research Laboratories, Nippon Steel Corp.
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FUJITA Tetsuo
Electronics Research Laboratories, Nippon Steel Corporation
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Fujita Tetsuo
Electronics Research Laboratories Nippon Steel Corporation:semiconductor Division Nippon Steel Corpo
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Kawamura K
Keio Univ. Yokohama
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Yano Takayuki
Advanced Technology Research Laboratories Nippon Steel Corp.
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Kajiyama K
Ion Engineering Research Institute Co.
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Yano T
Sumitomo Cement Co. Ltd. Chiba
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Fujita Tetsuo
Electrical & Signal Network System Department, Railway Operations Headquarters, JR East
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