Surface Particle Analysis of SIMOX (Separation by IMplanted OXygen) Wafers

スポンサーリンク

概要

著者

関連論文

Surface Particle Analysis of SIMOX (Separation by IMplanted OXygen) Wafers
Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process
Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures
Evaluation of Fixed Charge and Interface Trap Densities in SIMOX Wafers and Their Effects on Device Characteristics
Current-Path Observation in Low-Dose SIMOX (Separation by Implanted Oxygen) Buried-SiO_2 Layer
Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation
Control of Surface Reaction on Highly Accurate Low-k Methylsilsesquioxane Etching Process : Nuclear Science, Plasmas, and Electric Discharges
Magnetic Neutral Loop Discharge (NLD) Plasma and Application to SiO_2 Etching Process
Effect of Na_2O Addition to Ag_2O-Doped Phosphate Glasses on Enhancement of Silver Particle Precipitation by Low-Energy Ion Irradiation
Precipitation of Silver Particles in Glasses by Ion Irradiation
Measurement of Carrier Concentration at the GaAs-Si Interface in GaAs on Si by Raman Scattering
Optical Thickness Evaluation of Separation by IMplanted OXygen (SIMOX) Wafers

もっと見る

スポンサーリンク