Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-04-30

著者

• Kajiyama K

  Ion Engineering Res. Inst. Co. Osaka Jpn

• Hamaguchi I

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Takayama Seiji

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Takayama Seiji

  Advanced Semiconductor Materials And Devices Laboratories Nippon Steel Corporation

• YANO Takayuki

  Advanced Technology Research Laboratories, Nippon Steel Corp.

• Yano Takayuki

  Advanced Technology Research Laboratories Nippon Steel Corporation:(present Address)technical Develo

• KAWAMURA Keisuke

  Advanced Technology Research Laboratories, Nippon Steel Corporation

• HAMAGUCHI Isao

  Advanced Technology Research Laboratories, Nippon Steel Corporation

• NAGATAKE Youichi

  Advanced Technology Research Laboratories, Nippon Steel Corporation

• MATSUMURA Atsuki

  Advanced Technology Research Laboratories, Nippon Steel Corporation

• Kawamura Keisuke

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Kawamura Ken-ichi

  Hosono Transparent Electro-active Materials (team) Project Erato Japan Science And Technology Corpor

• Takayama Suguru

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Kawamura K

  Keio Univ. Yokohama

• Yano Takayuki

  Advanced Technology Research Laboratories Nippon Steel Corp.

• Kajiyama K

  Ion Engineering Research Institute Co.

• Nagatake Youichi

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Yano T

  Sumitomo Cement Co. Ltd. Chiba

• Hamaguchi Isao

  Advanced Technology Research Laboratories Nippon Steel Corporation

• Matsumura Atsuki

  Advanced Technology Research Laboratories Nippon Steel Corporation

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