Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-03-15
著者
-
Furukawa M
Canon Sales Co. Ltd. Tokyo Jpn
-
Furukawa M
Process Equipment Engineering Div. Canon Sales Co. Inc.:(present)utsunomiya Optical Products Operati
-
Furukawa Masakazu
Semiconductor Engineering Laboratory Pioneer Electronics Co.
-
SHINAGAWA Keisuke
Process Equipment Engineering Div., Canon Sales Co., Inc.
-
YAMAMOTO Jin
Process Equipment Engineering Div., Canon Sales Co., Inc.
-
KUSABA Kouta
Department of Applied Physics, Tokai University
-
SHINDO Haruo
Department of Applied Physics, Tokai University
-
FURUKAWA Masakazu
Process Equipment Engineering Div., Canon Sales Co., Inc.
-
Kajiyama K
Ion Engineering Res. Inst. Co. Osaka Jpn
-
Shindo H
Tokai Univ. Hiratsuka Jpn
-
Shindo H
Yamaguchi Univ. Yamaguchi Jpn
-
Shindo Haruo
Department Of Applied Physics Tokai University
-
SHINAGAWA Keisuke
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
-
FURUKAWA Masakazu
Aries Research Group
-
Kawamura K
Process Equipment Division Canon Sales Corporation
-
Shinagawa K
Canon Sales Co. Inc. Tokyo Jpn
-
Shinagawa Keisuke
Process Equipment Engineering Div. Canon Sales Co. Inc.
-
Kusaba K
Tohoku Univ. Miyagi Jpn
-
Yamamoto J
Process Equipment Engineering Div. Canon Sales Co. Inc.
-
Kusaba Kouta
Department Of Applied Physics Tokai University
-
Furukawa Masakazu
Process Equipment Engineering Div. Cannon Sales Co. Inc.
-
Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
-
Kawamura Ken-ichi
Hosono Transparent Electro-active Materials (team) Project Erato Japan Science And Technology Corpor
-
Kawamura K
Nihon Univ. Tokyo Jpn
-
Shindo Haruo
Department Of Applied Physics
関連論文
- Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
- Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
- Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
- Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
- Production of Large-Diameter Microwave Plasma with a High-Permittivity Material Window
- Reflow of PSG Layers by Halogen Lamp Short Duration Heating Technique
- Low Resistance Al/Si Ohmic Contacts on Boron Implanted Shallow p^+ Si Layers Formed by Halogen Lamp Annealing
- Contact Resistance of Al/Si Ohmic Electrodes Formed by Rapid Lamp Sintering.
- Two Step Rapid Heating Reflow of Borophosphosilicate Glass and Estimation for a Coefficient of Heating Delay by Thermal Analyses
- Effects of Nitrogen Addition to Microwave Oxygen Plasma in Surface Wave with Disk-Plate Window and Photoresist Ashing
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Long Line-Shaped Microwave Plasma Generation Employing a Narrow Rectangular Waveguide
- Deep dry etching of quartz plate over 100μm in depth for the fabrication of high performance analytical chip(ABSTRACTS OF PROCEEDINGS OF THE SCHOOL OF INFORMATION TECHNOLOGY AND ELECTRONICS SERIES J TOKAI UNIVERSITY -2003-2004-)
- A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
- Comparison of Deposition Characteristics between Triethyl and Trimethyl Borates in an Atmospheric Pressure Chemical Vapor Deposition Equipment with Tetraethyl Orthosilicate and O_3
- A Generalized Model for Resolution-Dependent Roughness Measured by an Optical Profiler for Optical Surfaces
- Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing
- Mode Transition Enhancement by Permittivity of Window Materials in Low Frequency Plasmas
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Floating Potential in Negative-Ion-Containing Plasma
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Kinetic Treatment of Self-Reversal in Reversed Field Pinch Plasma
- An X-Ray Diffraction and Electron Microscopic Study of a New High-T_c Superconductor based on the Bi-Ca-Sr-Cu-O System : Electrical Properties of Condensed Matter
- Analytical Electron Microscopic Study of High-T_c Superconductor Bi-Ca-Sr-Cu-O : Electrical Properties of Condensed Matter
- Synthesis of Long and Short Period Bi-Ca-Sr-Cu Oxides : Electrical Properties Condensed Matter
- Heliconwave Plasma Which Contains Negative Ion
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process
- Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose SIMOX Structures
- Evaluation of Fixed Charge and Interface Trap Densities in SIMOX Wafers and Their Effects on Device Characteristics
- Current-Path Observation in Low-Dose SIMOX (Separation by Implanted Oxygen) Buried-SiO_2 Layer
- Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation
- Fabrication of AlN/Al_2O_3 GHz Band SAW Filter and Simulation Analysis
- Applications of Wide-Band-Gap Materials for Optoelectronic Functional Devices Fabricated by a Pair of Interfering Femtosecond Laser Pulses
- Formation of Microstructure in SiO_2 Thin Film by a Femtosecond Laser Pulse
- Holographic Encoding of Permanent Gratings Embedded in Diamond by Two Beam Interference of a Single Femtosecond Near-Infrared Laser Pulse
- Establishment of Saha-Boltzmann Equilibrium for ArI Lower Excited Atoms in a Wall-Confined Arc Plasma
- Nanofabrication with a Novel EB System with a Large and Stable Beam Current
- Radio-Frequency Downstream Plasma Production by Surface-Wave in a Very High-Permittivity Material Discharge Tube
- Surface Wave Plasma Production Employing High-Permittivity Discharge Tube for Material Processing
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Band-Gap Energy and Effecive Mass of BGaN
- Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
- Dependence of Crystal Quality on Residual Strain in Strain-Controlled Thin AlN Layer Grown by Metalorganic Vapor Phase Epitaxy
- The Photopolymer Science and Technology Award
- Effect of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below
- Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems
- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
- Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
- Atomic Layer Controlled Digital Etching of Silicon
- Anomalous Hydrodynamic Behavior of Smectic Liquid Crystals at Low Frequencies
- Apparatus for Measurement of Complex Shear Modulus of Liquid Crystals at Low Frequencies : Physical Acoustics
- Native Response of C. elegans Encoded in Its Neuron Network : Cross-Disciplinary Physics
- Does a Randomly Organized Electrical Circuit Function as a Neuronal System?
- Theory of Artificial Atoms and Molecules using Semiconductor Quantum Dots
- Linear Conductance through Parallel Quantum Dot Dimer below the Kondo Temperature
- Conductance through Quantum Dot Dimer Below the Kondo Temperature
- Studies of Charging Effects on Resonant Tunneling Diodes in Terms of Extended Friedel Sum Rule
- Phase Shifts, the Friedel Sum Rule, Resonant Tunneling through Asymmetric Potentials
- Properties of Hydrophone with Porous Piezoelectric Ceramics : Piezoelectrics
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- Temperature Dependence of X-Ray Topographic Images Taken around Indentations of Si Single Crystals
- Warming Potential Reduction of C_4F_8 Using Inductively Coupled Plasma
- Characterization of EuBa_2Cu_3O_y Synthesized in Shock Processes
- Observation of Shock-Induced Phases of Nb_20_5 Single Crystal under High-Resolution Electron Microscopy
- Structure and Refractive Indices of Proton-Implanted LiNbO_3
- Laser-Induced Fluorescence Study of Penning Collision of Hel 2^1S Atom with Xe in He+Xe Gas Discharge Plasma : Waves, Optics and Quantum Electronics
- A Study of Capacitively Coupled Plasma Generation in Single-Loop Antennas : Nuclear Science, Plasmas, and Electric Discharges
- Analysis of Water-Stable Soil Aggregates with Special Reference to Degree of Aggregation
- Properties of Porous PZT Ceramics for Hydorophone Applications : P: PIEZOELECTRICS
- Changes in microbial biomass after continuous application of azolla and rice straw in soil
- Mineralization and changes in microbial biomass in water-saturated soil amended with some tropical plant residues
- Mineralization and microbial biomass formation in upland soil amended withs some tropical plant residues at different temperatures
- Phase Relaxation and Non-Equilibrium Transport Properties through Multilevel Quantum Dot
- A New Method of Line Plasma Production by Microwave in a Narrowed Rectangular Waveguide
- Adsorption, Activity, and Kinetics of Acid Phosphatase as Influenced by Selected Oxides and Clay Minerals
- Shock-Induced Changes in La_2CuO_4, La_2NiO_4, La_Sr_xCuO_4 and La_Sr_xNiO_4 Single Crystals
- Structural Study on High-T_c Superconductor Bi_(Ca, Sr)_3Cu_O_ : Electrical Properties of Condensed Matter
- Crystal Structures of YBa_2Cu_A_δO_ (A = Ni, Zn and Co) : Electrical Properties of Condensed Matter
- Crystal Structure of Tetragonal YBa_2Cu_Co_δO_(δ=0, 0.3)
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
- Fraunhoffer Diffraction of Electrons in Anisotropic Media
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection
- Electron Transport in Low-Stage Graphite-ICl Intercalation Compounds
- C-Axis Conduction in Low Stage Graphite Intercalation Compounds with Iodine Monochrolide
- Diamagnetism of Glassy Carbons
- A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
- Optimum Frequency for Inductively Coupled Plasma Generation with a Single-Loop Antenna
- New Emissive Probe Measurements of Electron Temperature in Two Modes of Radio-Frequency Plasmas