RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-15
著者
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堀池 靖浩
物質･材料研究機構
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Shindo H
Tokai Univ. Hiratsuka Jpn
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Shindo H
Yamaguchi Univ. Yamaguchi Jpn
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Shindo H
Samsung Yokohama Res. Inst. Yokohama Jpn
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Shindo Haruo
Faculty of Agriculture, Yamaguchi University
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Fukasawa Takayuki
Faculty of Engineering, Fukuyama University
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Nakamura Akihiro
Faculty of Engineering, Hiroshima University
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Horiike Yasuhiro
Faculty of Engineering, Toyo University
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Nakamura A
Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University
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Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Narai Akira
Faculty Of Engineering Hiroshima University
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Fukasawa Takayuki
Faculty Of Engineering Fukuyama University:(present Address)2nd Development Engineering Dpt. Tokyo E
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Shindo Haruo
Faculty Of Agriculture Nagoya University : (present Address) Faculty Of Agriculture Yamaguchi Univer
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堀池 靖浩
広島大工
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Fukasawa Teruichiro
Department Of Physics Science University Of Tokyo:(permanent Address)toshiba Manufacturing Engineeri
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Shindo Haruo
Faculty Of Agriculture Nagoya University
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