Horiike Yasuhiro | Faculty of Engineering, Toyo University

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概要

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著作論文

RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
Floating Potential in Negative-Ion-Containing Plasma
Sheath Width in Negative-Ion-Containing Plasma
Emissive Probe Study of CF_4/H_2 Etching Plasma
Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection

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