Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-11-30
著者
-
Shindo H
Samsung Yokohama Res. Inst. Yokohama Jpn
-
Shindo Haruo
Faculty of Agriculture, Yamaguchi University
-
Horiike Yasuhiro
Faculty of Engineering, Toyo University
-
NARAI Akira
Faculty of Engineering, Hiroshima University
-
HASHIMOTO Tetsuro
Faculty of Engineering, Hiroshima University
-
ICHIHASHI Hideki
Faculty of Engineering, Hiroshima University
-
Nakamura A
Faculty Of Pharmacy And Parmaceutical Sciences Fukuyama University
-
Shindo H
Department Of Electronics Faculty Of Engineering Hiroshima University
-
Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
-
Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
-
HASHIMOTO Tatsunori
Department of Electronics, Kyushu University
-
Narai Akira
Faculty Of Engineering Hiroshima University
-
Ichihashi Hideki
Faculty Of Engineering Hiroshima University
-
Hashimoto T
Department Of Chemistry For Materials Faculty Of Engineering Mie University
-
Shindo Haruo
Faculty Of Agriculture Nagoya University : (present Address) Faculty Of Agriculture Yamaguchi Univer
-
堀池 靖浩
広島大工
-
Hashimoto Tadanori
Department Of Chemistry For Materials Faculty Of Engineering Mie University
-
Iwasawa Hiroaki
Department Of Electrical Engineering Hiroshima University
-
Shindo Haruo
Faculty Of Agriculture Nagoya University
関連論文
- ラジアルラインスロットアンテナを用いた大口径均一プラズマの生成
- ラジアルラインスロットアンテナを用いたプラズマエッチング装置
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
- Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
- Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
- Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
- Production of Large-Diameter Microwave Plasma with a High-Permittivity Material Window
- 極微量全血分離・分析を目指したヘルスケアチップの創製
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- Microscopic Observation of Charred Plant Fragments Isolated from Several Ando Soil Samples by the Specific Gravity Method
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
- Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
- ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
- 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析
- Indonesian Medicinal Plants. XX. Chemical Structures of Eleuthosides A, B, and C, Three New Aromatic Glucosides from the Bulbs of Eleutherine palmifolia (Iridaceae)
- SEARCH FOR NATURAL AND SYNTHETIC IONOPHORES : EXPLOITATION OF NEW METHODS FOR MEASUREMENT OF ION-TRANSPORT AND ION-BINDING ACTIVITIES AND ION-PERMEABILITY
- カーボンナノチューブフィールドエミッターのI-V特性と先端構造
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Structural properties of plant charred materials in Andosols as revealed by X-ray diffraction profile analysis(Soil Chemistry and Soil Mineralogy)
- Contribution of charred and buried plant fragments to humic and fulvic acids in Japanese volcanic ash soils(Soil Chemistry)
- Humus and Phosphorus Composition of 3 Lake Sediments in Yamaguchi Prefecture
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Floating Potential in Negative-Ion-Containing Plasma
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Kinetic Treatment of Self-Reversal in Reversed Field Pinch Plasma
- Asymmetric Flux Generation and Its Relaxation in Reversed Field Pinch
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
- 水素+水蒸気プラズマダウンフローへのNF_3添加によるシリコン表面の自然酸化膜除去
- テトラフルオロエチルトリフルオロメチルエーテル(HFE 227)への有機シラン添加による高選択比・高アスペクト比酸化膜エッチング
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- Effect of Continuous Compost Application on Water-Stable Soil Macroaggregation in a Field Subjected to Double Cropping
- Heliconwave Plasma Which Contains Negative Ion
- 2.4GHzフロントエンドAlN/α-Al_2O_3 SAWマッチトフィルタ
- 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
- 日々の健康管理 -ヘルスケアデバイスの創製-
- プラズマプロセスによるバイオチップの開発と展望
- 大気圧マイクロプラズマジェットの微細加工への応用
- VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用
- 高アスペクト比ULSIエッチング技術
- 5.最近のトピックス : 5.2フッ素,塩素負イオン生成とSi,SiO_2とのエッチング反応 : 負イオンを見直そう(負イオン特集)
- BEHAVIOR OF PHENOLIC SUBSTANCES IN THE DECAYING PROCESS OF PLANTS : IX. Distribution of Phenolic Acids in Soils of Paddy Fields and Forests
- Effects of carbonaceous materials on the accumulation of readily mineralizable organic nitrogen in soil
- Behavior of phenolic substances in the decaying process of plants : X. Distribution of phenolic acids in soils of greenhouses and fields
- COMPARISON OF HUMIC ACIDS FROM CHARRED RESIDUES OF SUSUKI (EULALIA, Miscanthus sinensis A.) AND FROM THE A HORIZONS OF VOLCANIC ASH SOILS
- HUMUS COMPOSITION OF CHARRED PLANT RESIDUES
- プロセス用プラズマの制御最前線 (制御されたプロセス用プラズマを目指して--その現状と将来展望)
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- 0.13μm Metal-Oxide-Nitride-Oxide-Semiconductor Single Transistor Memory Cell with Separated Source Line
- Analysis of Carrier Traps in Si_3N_4N_4 in Oxide/Nitride/Oxide for Metal/Oxide/Nitride/Oxide/Silicon Nonvolatile Memory
- Development of Sub-Quarter-μm MONOS (metal/oxide/nitride/oxide/semiconductor)Type Memory Transistor
- Development of Sub-Quarter-μm MONOS Type Memory Transistor
- POLYMERIZATION OF HYDROQUINONE AS INFLUENCED BY SELECTED INORGANIC SOIL COMPONENTS
- BEHAVIOR OF PHENOLIC SUBSTANCES IN THE DECAYING PROCESS OF PLANTS : VIII. Changes in the Quality and Quantity of Phenolic Substances in the Decaying Process of Rice Straw, Ladino Clover, and Red Oak Leaves
- Sheath Width in Negative-Ion-Containing Plasma
- Catalytic Synthesis of Humic Acids from Phenolic Compounds by Mn(IV) Oxide (Birnessite)
- OXIDATIVE COUPLING ACTIVITY IN CITRATE BUFFER EXTRACTS OF SOILS
- Elementary Composition, Humus Composition, and Decomposition in Soil of Charred Grassland Plants
- OXIDATIVE COUPLING ACTIVITY IN SOILS OF PADDY AND UPLAND FIELDS
- Distribution of charred plant fragments in particle size fractions of Japanese volcanic ash soils(Soil Chemistry and Mineralogy)
- Emissive Probe Study of CF_4/H_2 Etching Plasma
- BEHAVIOR OF PHENOLIC SUBSTANCES IN THE DECAYING PROCESS OF PLANTS : VII. Characteristics of Phenolic Substances in the Humic Acids of Decayed Rice Straw and Compost-Supplied Field Soil
- Role of Catalytic Effect and Components of Volcanic Ash in the Synthesis of Humic Acids from Phenolic Compounds
- Relative Effectiveness of Short-Range Ordered Mn(IV), Fe(III), Al, and Si Oxides in the Synthesis of Humic Acids from Phenolic Compounds
- Analysis of Water-Stable Soil Aggregates with Special Reference to Degree of Aggregation
- Relationships between Aggregation and Hyphal Length and Microbial Biomass C in Soil Amended with Rice Straw or Azolla
- Role of Active Aluminum in the Formation of Water-Stable Macroaggregates
- Catalytic Role of Mn(IV) Oxide in the Formation of Humic-Enzyme Complexes in the Soil Ecosystem
- Changes in microbial biomass after continuous application of azolla and rice straw in soil
- Mineralization and changes in microbial biomass in water-saturated soil amended with some tropical plant residues
- Mineralization and microbial biomass formation in upland soil amended withs some tropical plant residues at different temperatures
- Adsorption, Activity, and Kinetics of Acid Phosphatase as Influenced by Selected Oxides and Clay Minerals
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection
- Relationship between distribution of charred plant residues and humus composition in chernozemic soils
- Downstream Etching of Si and SiO_2 Employing CF_4/O_2 or NF_3/O_2 at High Temperature : Etching and Deposition Technology
- Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field