High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-11-20

著者

• Shindo H

  Samsung Yokohama Res. Inst. Yokohama Jpn

• Shindo Haruo

  Faculty of Agriculture, Yamaguchi University

• Horiike Yasuhiro

  Faculty of Engineering, Toyo University

• HASHIMOTO Tetsuro

  Faculty of Engineering, Hiroshima University

• AMASAKI Fumitake

  Faculty of Engineeringm, Hiroshima University

• Shindo H

  Department Of Electronics Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Department Of Electrical Engineering Toyo University

• Hashimoto T

  Department Of Chemistry For Materials Faculty Of Engineering Mie University

• 堀池 靖浩

  広島大工

• Shindo Haruo

  Faculty Of Agriculture Nagoya University

• Amasaki Fumitake

  Faculty Of Engineeringm Hiroshima University

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