In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-06-30
著者
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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SAKAUE Hiroyuki
Department of Electrical Engineering, Hiroshima University
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KOTO Makoto
Department of Electrical Engineering, Hiroshima University
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Koto Makoto
Department Of Electrical Engineering Hiroshima University
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SAKAUE Hiroyuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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堀池 靖浩
広島大工
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Sakaue H
Hiroshima University Graduate School Of Adsm
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Sakaue Hiroyuki
Department Of Electrical Engineering Hiroshima University
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