Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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堀池 靖浩
物質･材料研究機構
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Kikuchi J
Axiomatic Inc. Tokyo Jpn
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KIKUCHI Jun
Manufacturing Technology Division, Fujitsu Ltd.
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NAGASAKA Mitsuaki
Manufacturing Technology Division, Fujitsu Ltd.
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FUJIMURA Shuzo
Process Development Division, Fujitsu Ltd.
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YANO Hiroshi
Manufacturing Technology Division, Fujitsu Ltd.
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HORIIKE Yasuhiro
Electrical & Electronics Engineering, Toyo University
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Fujimura Shuzo
Precess Development Division C850 Fujitsu Limited
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Fujimura Shuzo
Process Development Division Fujitsu Ltd.
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Fujimura Shuzo
Process Development Div. C850 Fujitsu Ltd.
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Nagasaka Mitsuaki
Manufacturing Technology Division Fujitsu Ltd.
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Horiike Yasuhiro
Faculty Of Engineering Toyo University
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Horiike Yasuhiro
National Institute For Materials Science
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Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
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Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
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Kikuchi Jun
Manufacturing Technology Division Fujitsu Ltd.
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堀池 靖浩
広島大工
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Yano H
Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company
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