Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• 堀池 靖浩

  物質･材料研究機構

• Kikuchi J

  Axiomatic Inc. Tokyo Jpn

• KIKUCHI Jun

  Manufacturing Technology Division, Fujitsu Ltd.

• NAGASAKA Mitsuaki

  Manufacturing Technology Division, Fujitsu Ltd.

• FUJIMURA Shuzo

  Process Development Division, Fujitsu Ltd.

• YANO Hiroshi

  Manufacturing Technology Division, Fujitsu Ltd.

• HORIIKE Yasuhiro

  Electrical & Electronics Engineering, Toyo University

• Fujimura Shuzo

  Precess Development Division C850 Fujitsu Limited

• Fujimura Shuzo

  Process Development Division Fujitsu Ltd.

• Fujimura Shuzo

  Process Development Div. C850 Fujitsu Ltd.

• Nagasaka Mitsuaki

  Manufacturing Technology Division Fujitsu Ltd.

• Horiike Yasuhiro

  Faculty Of Engineering Toyo University

• Horiike Yasuhiro

  National Institute For Materials Science

• Horiike Yasuhiro

  Faculty Of Engineering Hiroshima University

• Horiike Yasuhiro

  Department Of Electrical Engineering Toyo University

• Kikuchi Jun

  Manufacturing Technology Division Fujitsu Ltd.

• 堀池 靖浩

  広島大工

• Yano H

  Process And Manufacturing Engineering Center Toshiba Corporation Semiconductor Company

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