Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
-
KAWAMURA Katsufumi
Process Equipment Division, Canon Sales Corporation
-
Kawamura K
Process Equipment Division Canon Sales Corporation
-
Horiike Yasuhiro
Faculty of Engineering, Toyo University
-
SAKAUE Hiroyuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
-
Horiike Yasuhiro
Faculty Of Engineering Hiroshima University
-
Horiike Yasuhiro
Department Of Electrical Engineering Toyo University
-
堀池 靖浩
広島大工
-
Sakaue H
Hiroshima University Graduate School Of Adsm
-
Kawamura K
Nihon Univ. Tokyo Jpn
-
KAWAMURA Kohei
Faculty of Engineering, Hiroshima University
-
ISHIZUKA Shunichi
Faculty of Engineering, Hiroshima University
-
SAKAUE Hiroyuki
Faculty of Engineering, Hiroshima University
-
Ishizuka Shuichi
Faculty Of Engineering Hiroshima University
関連論文
- ラジアルラインスロットアンテナを用いた大口径均一プラズマの生成
- ラジアルラインスロットアンテナを用いたプラズマエッチング装置
- ナノピラー構造体が電気浸透流に及ぼす影響の評価
- Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
- Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
- Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
- Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
- Production of Large-Diameter Microwave Plasma with a High-Permittivity Material Window
- 極微量全血分離・分析を目指したヘルスケアチップの創製
- Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
- 1P169 タンパク質標識に用いる金ナノ粒子の作製法の開発(分子モーター,第48回日本生物物理学会年会)
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
- Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
- Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
- High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
- RF Self-Bias Characteristics in Inductively Coupled Plasma
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
- Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
- Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
- High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
- ナノポアを通過する長鎖DNAのイメージング解析 : DNAの核膜孔通過過程のモデリングを目指して
- 18pYF-11 マイクロ・ナノチップ中における長鎖DNAのダイナミクスの解析
- カーボンナノチューブフィールドエミッターのI-V特性と先端構造
- Fabrication of Carbon Nanotube and Nanorod Arrays Using Nanoporous Templates
- Contact Resistance Reduction Using Vacuum Loadlock System and Plasma Dry Cleaning
- Formation of Ultra-High-Density Ferromagnetic Column Arrays Beyond 1 Tera/inch^2 Using Porous Alumina Template(Nano-Fabrication and Patterned Media)
- Effect of Additives on Hole Filling Characteristics of Electroless Copper Plating
- Highly Adhesive Electroless Cu Layer Formation Using an Ultra Thin Ionized Cluster Beam (ICB)-Pd Catalytic Layer for Sub-100 nm Cu Interconnections
- Thickness Dependences of Nucleation and Annihilation Fields of Magnetic Vortices in Submicron Supermalloy Dots
- Influence of Surface Oxide of Sputtered TaN on Displacement Plating of Cu
- Computer-Aided Chemistry Estimation Method of Electronic-Polarization Dielectric Constants for the Molecular Design of Low-k Materials
- Formation of Al Dot Hexagonal Array on Si Using Anodic Oxidation and Selective Etching : Surfaces, Interfaoes, and Films
- Adsorbed Water on a Silicon Wafer Surface Exposed to Atmosphere : Semiconductors
- Study of a Dielectric Constant Due to Electronic Polarization Using a Semiempirical Molecular Orbital Method I : Semiconductors
- Scanning Electron Microscope Observation of Heterogeneous Three-Dimensional Nanoparticle Arrays Using DNA : Surfaces, Interfaces, and Films
- Self-Organized Gold Nanodots Array on a Silicon Substrate and Its Mechanical Stability
- Control of Interdot Space and Dot Size in a Two-Dimensional Gold Nanodot Array
- Self-Organization of a Two-Dimensional Array of Gold Nanodots Encapsulated by Alkanethiol
- Ordered Two-Dimensional Nanowire Array Formation Using Self-Organized Nanoholes of Anodically Oxidized Aluminum
- Highly Selective SiO_2 Etching Using CF_4/C_2H_4
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
- Floating Potential in Negative-Ion-Containing Plasma
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- Fluorescence Emission Control of Long DNA Molecules Adsorbed on microelectrode Surfaces by External Voltage
- Molecular Detection in a Microfluidic Device by Streaming Current Measurements
- Translocation of a Long DNA Chain Passing Through a Nanofabricated Pore
- Study on Elemental Technologies for Creation of Healthcare Chip Fabricated on Polyethylene Terephthalate Plate
- 水素+水蒸気プラズマダウンフローへのNF_3添加によるシリコン表面の自然酸化膜除去
- テトラフルオロエチルトリフルオロメチルエーテル(HFE 227)への有機シラン添加による高選択比・高アスペクト比酸化膜エッチング
- Scanning Tunneling Microscopy Observation on the Atomic Structures of Step Edges and Etch Pits on a NH_4F-Treated Si(111) Surface
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- 多項目同時測定ヘルスケアチップ用マイクログルコースセンサーの創製
- Cleaning of Silicon Surfaces by NF_3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Cleaning of Silicon Surfaces by NF_3 Added Hydrogen and Water Vapor Plasma Downstream Treatment
- 2.4GHzフロントエンドAlN/α-Al_2O_3 SAWマッチトフィルタ
- 高齢化社会の到来とヘルスケアチップの創製 : ドライエッチング技術の展開
- 日々の健康管理 -ヘルスケアデバイスの創製-
- Dislocation Density Reduction in SIMOX (Separation by Implanted Oxygen) Multi-Energy Single Implantation
- プラズマプロセスによるバイオチップの開発と展望
- 大気圧マイクロプラズマジェットの微細加工への応用
- VHF駆動によるマイクロプラズマの生成技術とマイクロ化学分析システムへの応用
- 高アスペクト比ULSIエッチング技術
- 5.最近のトピックス : 5.2フッ素,塩素負イオン生成とSi,SiO_2とのエッチング反応 : 負イオンを見直そう(負イオン特集)
- プロセス用プラズマの制御最前線 (制御されたプロセス用プラズマを目指して--その現状と将来展望)
- Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
- Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
- Excitation of Sheath Oscillating Current by Superimposing Pulse Voltage
- Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
- Atomic Layer Controlled Digital Etching of Silicon
- Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- Properties of Hydrophone with Porous Piezoelectric Ceramics : Piezoelectrics
- 負イオンプラズマによるシリコンエッチング
- 4. 高密度RFプラズマによる高速・高選択比SiO_2エッチングと反応機構 (ドライエッチング用プラズマ)
- Silicon Etching Employing Negative Ion in SF_6 Plasma
- 半導体製造用プロセシングプラズマ(期待されるブレイクスルー)
- Sheath Width in Negative-Ion-Containing Plasma
- Emissive Probe Study of CF_4/H_2 Etching Plasma
- 容量結合型大気圧マイクロプラズマ源
- 医療
- Experimental Study of Temperatures of Atmospheric-Pressure Nonequilibrium Ar/N_2 Plasma Jets and Poly(ethylene terephtalate)-Surface Processing
- Properties of Porous PZT Ceramics for Hydorophone Applications : P: PIEZOELECTRICS
- Development of Clinical Chips for Home Medical Diagnostics
- 在宅で健康診断できるヘルスケアチップの開発 (特集 診断バイオチップの未来)
- μ-TAS応用によるバイオセンサ式ヘルスケアチップ (特集 流体MEMSのすべて--マイクロ流体デバイスの応用展開とその実用化)
- Resistance Oscillations Induced by Direct Current Electromigration
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
- Fraunhoffer Diffraction of Electrons in Anisotropic Media
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection
- Study on Adsorption Behavior of Organic Contaminations on Silicon Surface by Gas Chromatography/Mass Spectrometry
- Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
- Diamagnetism of Glassy Carbons