Effect of Additives on Hole Filling Characteristics of Electroless Copper Plating
スポンサーリンク
概要
- 論文の詳細を見る
- 2004-10-15
著者
-
新宮原 正三
Hiroshima University Graduate School Of Adsm
-
SAKAUE Hiroyuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
-
SHINGUBARA Shoso
Graduate School of Advanced Sciences of Matter, Hiroshima University
-
TAKAHAGI Takayuki
Graduate School of Advanced Sciences of Matter, Hiroshima University
-
WANG Zenglin
Graduate School of Advanced Science of Matter, Hiroshima University
-
YAEGASHI Osamu
Graduate School of Advanced Science of Matter, Hiroshima University
-
Wang Z
Tokyo Inst. Technol. Tokyo Jpn
関連論文
- Si貫通ビアへの応用に向けた無電解めっき技術の研究(センサーデバイス,MEMS,一般)
- 24aPS-23 HiSORにおける光電子顕微鏡(PEEM)を用いた磁区構造研究(領域5ポスターセッション,領域5(光物性))
- ナノ粒子積層による低誘電率ポーラスダイヤモンド膜の形成
- 1P169 タンパク質標識に用いる金ナノ粒子の作製法の開発(分子モーター,第48回日本生物物理学会年会)
- Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
- Al Etching Characteristics Ernploying Helicon Wave Plasma
- Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
- 1P170 金ナノ粒子を用いた細胞質ダイニン複合体の電子顕微鏡観察(分子モーター,第48回日本生物物理学会年会)
- 1P171 多機能GFPタグで見えてきた哺乳類細胞におけるダイニン-ダイナクチンのダイナミックな動態(分子モーター,第48回日本生物物理学会年会)
- Fabrication of Carbon Nanotube and Nanorod Arrays Using Nanoporous Templates
- Contact Resistance Reduction Using Vacuum Loadlock System and Plasma Dry Cleaning
- Formation of Ultra-High-Density Ferromagnetic Column Arrays Beyond 1 Tera/inch^2 Using Porous Alumina Template(Nano-Fabrication and Patterned Media)
- Effect of Additives on Hole Filling Characteristics of Electroless Copper Plating
- Highly Adhesive Electroless Cu Layer Formation Using an Ultra Thin Ionized Cluster Beam (ICB)-Pd Catalytic Layer for Sub-100 nm Cu Interconnections
- Thickness Dependences of Nucleation and Annihilation Fields of Magnetic Vortices in Submicron Supermalloy Dots
- Influence of Surface Oxide of Sputtered TaN on Displacement Plating of Cu
- Computer-Aided Chemistry Estimation Method of Electronic-Polarization Dielectric Constants for the Molecular Design of Low-k Materials
- Formation of Al Dot Hexagonal Array on Si Using Anodic Oxidation and Selective Etching : Surfaces, Interfaoes, and Films
- Adsorbed Water on a Silicon Wafer Surface Exposed to Atmosphere : Semiconductors
- Study of a Dielectric Constant Due to Electronic Polarization Using a Semiempirical Molecular Orbital Method I : Semiconductors
- Scanning Electron Microscope Observation of Heterogeneous Three-Dimensional Nanoparticle Arrays Using DNA : Surfaces, Interfaces, and Films
- Well-size-controlled Golloidal Gold nanoparticles Dispersed in Organic Solvents
- Self-Organized Gold Nanodots Array on a Silicon Substrate and Its Mechanical Stability
- Control of Interdot Space and Dot Size in a Two-Dimensional Gold Nanodot Array
- Self-Organization of a Two-Dimensional Array of Gold Nanodots Encapsulated by Alkanethiol
- Ordered Two-Dimensional Nanowire Array Formation Using Self-Organized Nanoholes of Anodically Oxidized Aluminum
- LSI配線信頼性技術における課題と今後の方向
- Highly Selective SiO_2 Etching Using CF_4/C_2H_4
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- In-Situ X-Ray Photoelectron Spectroscopy of Reactive-Ion-Etched Surfaces of Indium-Tin Oxide Film Employing Alcohol Gas
- 無電解ボトムアップめっきにおける添加剤の効果
- 3P157 DIFFUSIVE MOVEMENT OF A SINGLE-MOLECULE MAMMALIAN CYTOPLASMIC DYNEIN(Molecular motor,The 48th Annual Meeting of the Biophysical Society of Japan)
- Scanning Tunneling Microscopy Observation on the Atomic Structures of Step Edges and Etch Pits on a NH_4F-Treated Si(111) Surface
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Si(100)ウエハ表面の原子レベル制御とその評価
- 陽極酸化アルミナ・ナノホール中に形成したCo細線配列の磁気特性
- 無電解めっきでのボトムアップ堆積による微細接続孔埋め込み(低誘電率層間膜,配線材料及び一般)
- バリアメタル上の触媒なし無電解銅めっき技術
- 強磁性体微細ドットの磁化特性のサイズ及び膜厚依存性
- 18aWA-6 強磁性微細ドットにおける磁気特性の形状依存性
- Contact Resistance of SnO_2 Films Determined by the Transmission Line Model Method
- Preparation and Piezoresistive Properties of Polycrystalline SnO_2 Films
- Emission Properties of YBa_2Cu_3O_-Film Photoswitches as Terahertz Radiation Sources
- Novel Terahertz Radiation from Flux-Trapped YBa_2Cu_30_ Thin Films Excited by Femtosecond Laser Pulses
- Terahertz Emission Study of Femtosecond Time-Transient Nonequilibrium State in Optically Excited YBa_2Cu_3O_ Thin Films
- Enhanced Sub-Picosecond Electromagnetic Radiation from YBa_2Cu_3O_ Thin-Film Bow-Tie Antennas Excited with Femtoseconds Laser Pulses
- Emission Properties of YBCO-Film Photo-Switches as THz Radiation Sources
- Ultrashort Electromagnetic Pulse Radiation from YBCO Thin Films Excited by Femtosecond Optical Pulse
- Multiple-Tip Effect on Scanning Tunneling Microscope Images of Deoxyribonucleic Acid
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
- 3P-198 トランスポゾンランダム挿入法を用いた1型リアノジン受容体の構造機能解析(生体膜/人工膜・興奮,チャネル,第46回日本生物物理学会年会)
- Experimental Study of Temperatures of Atmospheric-Pressure Nonequilibrium Ar/N_2 Plasma Jets and Poly(ethylene terephtalate)-Surface Processing
- Adsorption of Dibutyl Phthalate and Dioctyl Phthalate on Si Substrate
- Analysis of Chemical Structures of Ulthathin Oxynitride Films by X-Ray Photoelectron Spectroscopy and Secondary Ion Mass Spectrometry
- Corrosion Prevention of Pure Iron Using Self-Assembled Monolayer Coating
- Resistance Oscillations Induced by Direct Current Electromigration
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection : Beam Induced Physics and Chemistry
- Diagnostics of Hydrogen Role in the Si Surface Reaction Processes Employing In-situ Fourier Transform Infrared-Attenuated Total Reflection
- Study on Adsorption Behavior of Organic Contaminations on Silicon Surface by Gas Chromatography/Mass Spectrometry
- アルミニウム配線中のボイドのエレクトロマイグレーション挙動の分子動力学シミュレーション
- Electromigration Characteristics of Cu-Al Precipitate in AlCu Interconnection
- Sputtering of Aluminum Film Using Microwave Plasma with High Magnetic Field
- 金ナノ粒子触媒を用いた無電解バリア/シード層のCu-TSVへの応用(電子デバイスの高速・高密度実装とインテグレーション技術論文)
- 2M1424 哺乳類細胞質ダイニンが示す拡散と一方向性の運動の転換について(分子モーター3,第49回日本生物物理学会年会)
- 3次元実装TSVへのコンフォーマル無電解バリアメタルの形成(配線・実装技術と関連材料技術)
- Highly Adhesive Electroless Cu Layer Formation Using an Ultra Thin Ionized Cluster Beam (ICB)-Pd Catalytic Layer for Sub-100 nm Cu Interconnections
- Effect of Additives on Hole Filling Characteristics of Electroless Copper Plating