Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-01-15
著者
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SHINGUBARA Shoso
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Nakano M
Advanced Technology Research Laboratories Sharp Corporation
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NAKANO Masayuki
Device Technology Research Laboratories, Sharp Corporation
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KOTAKI Hiroshi
Device Technology Research Laboratories, Sharp Corporation
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OHTA Kenji
Device Technology Research Laboratories, Sharp Corporation
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