Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded SOI Wafers

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• Mitani Kenichiro

  Hypermedia Research Center Sanyo Electric Co. Ltd.

• Nakano M

  Advanced Technology Research Laboratories Sharp Corporation

• AGA Hiroji

  Isobe R&D Center, Shin-Estu Handotai Co., Lid.

• NAKANO Masatake

  Isobe R&D Center, Shin-Estu Handotai Co., Lid.

• MITANI Kiyoshi

  Isobe R&D Center, Shin-Estu Handotai Co., Lid.

• Mitani K

  Sanyo Electric Co. Ltd. Gifu Jpn

• Mitani Kiyoshi

  Isobe R&d Center Shin-etsu Handotai

• Aga Hiroji

  Isobe R&d Center Shin-estu Handotai Co. Lid.

• Nakano Masatake

  Isobe R&D Center, Shin-Estu Handotai Co., Lid.

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• Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded SOI Wafers
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