Novel Ultra-Clean Self Aligned Silicide (Salicide) Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1μm Gate Electrode

スポンサーリンク

概要

著者

関連論文

Lung-Specific DNA Damage Induced by Methylated Arsenics (Proceedings of the 16 th Symposium on Environmental Pollutants and Toxicology)
Heavy-Metal(Fe/Ni/Cu)Behavior in Ultrathin Bonded Silicon-On-Insulator(SOI)Wafers Evaluated Using Radioactive Isotope Tracers
Influence of N_2O Oxynitridation on Interface Trap Generation in Surface-Channel p-Channel Metal Oxide Semiconductor Field Effect Transistors
Influence of N_2O-Oxynitridation on Interface Trap Generation in Surface-Channel PMOSFETs
Thickness Dependence of Furnace N_2O-Oxynitridation Effects on Breakdown of Thermal Oxides
Novel Low Leakage and Low Resistance Titanium Salicide Technology with Recoil Nitrogen Achieved by Silicidation after Ion Implantation through Contamination-Restrained Oxygen Free LPCVD-Nitride Layer (SICRON)
Oral Administration on Dimethylarsinic Acid, a Main Metabolite of Inorganic Arsenic, in Mice Promotes Skin Tumorigenesis Initiated by Dimethylbenz(a)anthracene with or without Ultraviolet B as a Promoter
72-kDa Stress Protein (Hsp72) Induced by Administration of Dimethylarsinic Acid to Mice Accumulates in Alveolar Flat Cells of Lung, a Target Organ for Arsenic Carcinogenesis
Cell-Nuclear Accumulation of 72-kDa Stress Protein Induced by Dimethylated Arsenics
Cell-nuclear Accumulation of Stress Protein (Hsp72) Induced by Dimethylarsenics (Proceedings of the 20th Symposium on Toxicology and Environmental Health)
Difference between Fresh-Water and Seawater Fishes in the Accumu lation of Environmental Chemical Pollutants
Low Resistance and Thermally Stable Ti-Silicided Shallow Junction Formed by Advanced 2-Step Rapid Thermal Processing and Its Application to Deep Submicron Contact
Enzymatic Synthesis of a Novel Trisaccharide, Glucosyl Lactoside
MOCVD Growth of InP on 4-inch Si Substrate with GaAs Intermediate Layer
Seeded Electron Beam Recrystallization of Large Area SOI Using Striped Tungsten Encapsulation Technique
Elevated Polycide Source/Drain Shallow Junctions with Advanced Silicidation Processing and Al Plug/Collimated PVD (Physical Vapor Deposition)- Ti/TiN/Ti/Polycide Contact for Deep-Submicron Complementary Metal-Oxide Semiconductors
Purification and Properties of a Novel Enzyme, Trehalose Synthase, from Pimelobacter sp.R48
Power Durability of Al-W Alloy Electrodes Used in RF-Band Surface Acoustic Wave Filters
The Power Durability of 900 MHz Band Double-Mode-Type Surface Acoustic Wave Filters and Improvement in Power Durability of Al-Cu Thin Film Electrodes by Cu Atom Segregation
Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
Study of an Elevated Drain Fabrication Method for Ultra-Shallow Junction
Study of HF Defects in Thin, Bonded Silicon-on-Insulator Dependent on Original Wafers
Epitaxial Growth of (Sr, Ba)Nb_2O_6 Thin Films by Pulsed Laser Deposition
Study of HF Defects in Thin Bonded SOI Dependent on Original Wafers
Novel Ultra-Clean Self Aligned Silicide (Salicide) Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1μm Gate Electrode
Advanced Trench and Local Oxidation of Silicon (LOCOS) Isolation Technology for Ultra-Low-Power Bulk Dynamic Threshold Metal Oxide Semiconductor Field Effect Transistor (B-DTMOS)
Fabrication and Characterization of (Sr, Ba)Nb_2O_6 Thin Films by Pulsed Laser Deposition
Ba_Sr_TiO_3 Thin Film Production on Atomically Flat SrTiO_3(100)Substrates by a Pulsed Laser Deposition and Dielectric properties
Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded Silicon on Insulator (SOI) Wafers
Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded SOI Wafers
Novel Oxygen Free Titaniurm Silicidation (OFS) Processing for Low Resistance and Thermally Stable SALICIDE (Self-Aligned Silicide) in Deep Submicron Dual Gate CMOS (Complementary Metal-Oxide Semiconductors)
Low-Temperature-Fireable Dielectric Material Pb(Fe_W_)O_3-(Pb,Ca)(Fe_Nb_)O_3 for Microwave Use
A Four-Band Hubbard Model for Doped CuO_5 and Related Clusters. Populations of Holes on Apex Oxygens Determined by the Full VB CI Method
A Two-Band Hubbard Model for Clusters of Doped Copper Oxides and Other Metal Oxides: Populations of Holes and Spin Densities by the Full VB CI Method
Extended Hubbard Models for Transition Metal Oxides and Halides: Importance of Spin and Charge Fluctuations in Charge Transfer Metals : Electrical Properties of Condensed Matter
Difference between Fresh and Sea Water Fishes in the Accumulation of Environmental Chemical Pollutants. II Uptake and Elimination of Chlorobenzenes by Killifish (Oryzias latipes) (Proceedings of the 14th Symposium on Environmental Pollutants and Toxicolog
Existence of a Novel Enzyme Converting Maltose into Trehalose
Heavy Metal(Cu/Fe/Ni) Behavior in Ultra thin Bonded SOI Wafers Evaluated by Using Radioactive Isotope Tracers
Silver Negative-Ion Implantation into Thermally Grown Thin SiO2 Film on Si Substrate and Heat Treatment for Formation of Silver Nanoparticles
Novel Nonvolatile Random-Access Memory with Si Nanocrystals for Ultralow-Power Scheme
Occurrence of Tetrodotoxin in a Starfish, Astropecten scoparius

もっと見る

スポンサーリンク