Sugimoto Kazuo | Advanced Technology Research Laboratories Sharp Corporation
スポンサーリンク
概要
関連著者
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Kakimoto S
Mitsubishi Electric Corp. Hyogo Jpn
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Kakimoto Seizo
Advanced Technology Research Laboratories Sharp Corporation
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Sugimoto Kazuo
Advanced Technology Research Laboratories Sharp Corporation
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Kotaki Hiroshi
Advanced Technology Research Laboratories Sharp Corporation
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KAKIMOTO Seizo
Central Research Laboratories, Sharp Corporation
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KOTAKI Hiroshi
Central Research Laboratories, Sharp Corporation
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NAKANO Masayuki
Central Research Laboratories, Sharp Corporation
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Kakimoto Seizo
Central Research Laboratories Sharp Corporation
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NARA MASATO
Shizuoka Prefectural Fisheries Experiment Station
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Nakano M
Advanced Technology Research Laboratories Sharp Corporation
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Nakano M
National Mito Hospital
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Nakano Masayuki
Central Research Laboratories Sharp Corporation
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Hamaguchi Chihiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
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Matsuoka Toshimasa
Department Of Electronic Engineering Osaka University
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TAGUCHI Shigenari
Department of Electronic Engineering, Osaka University
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KAKIMOTO Seizou
Central Research Laboratories, Sharp Corporation
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Taguchi S
Tanaka Kikinzoku Kogyo K. K. Atugi-shi Jpn
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Nakano Masayuki
National Mito Hospital
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TANIGUCHI Kenji
Department of Cancer Research, Fuji Gotemba Research Laboratories, Chugai and Pharmaceutical Co
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Hamaguchi Chihiro
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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UDA Keiichiro
Central Research Laboratories, Sharp Corporation
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Takagi Junkou
Central Research Laboratories, Sharp Corporation
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HAYASHIDA Shigeki
Central Research Laboratories, Sharp Corporation
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Takagi J
Sharp Corp. Nara Jpn
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Takagi Junkou
Central Research Laboratories Sharp Corporation
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Uda Keiichiro
Central Research Laboratories Sharp Corporation
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Nakano Masatake
Thin Film Soi Group.process Engineering Dept.isobe R&d Shin-etsu Handotai Co. Ltd.
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Hayashida S
Ntt Opto-electronics Laboratories
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Taniguchi Kenji
Department Of Biotechnology Tottori University
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Matsuoka Toshimasa
Department of Electrical, Electronic and Information Engineering, Osaka University
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Ohta Kenji
Advanced Technology Research Laboratories Sharp Corporation
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Kataoka K
Central Research Laboratories Sharp Corporation
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Matsuoka Toshimasa
Central Research Laboratories Sharp Corporation
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MATSUOKA Toshimasa
Faculty of Engineering, Osaka University
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TANIGUCHI Kenji
Faculty of Engineering, Osaka University
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Taguchi Shigenari
Faculty of Engineering, Osaka University
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Hamaguchi Chihiro
Faculty of Engineering, Osaka University
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NAKANO Akihiko
Analysis Center, (IC) Group, Sharp Corpotation
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UDA Keichiro
Central Research Laboratories, Sharp Corporation
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SATO Yuichi
Central Research Laboratories, Sharp Corporation
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Ohta K
Advanced Technology Research Laboratories Sharp Corporation
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FUKUSHIMA Takashi
Central Research Laboratories, SHARP Corporation
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MITSUHASHI Katsunori
Central Research Laboratories, Sharp Corporation
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Kataoka Kotaro
Central Research Laboratories Sharp Corporation
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Adachi Kazunari
Department Of Electrical And Information Engineering Yamagata University
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Fukushima Takashi
Central Research Laboratories Sharp Corporation
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Uda Keichiro
Central Research Laboratories Sharp Corporation
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NAKANO Masayuki
Advanced Technology Research Laboratories, Sharp Corporation
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KOTAKI Hiroshi
Advanced Technology Research Laboratories, Sharp Corporation
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SUGIMOTO Kazuo
Advanced Technology Research Laboratories, Sharp Corporation
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OKUMINE Tetsuya
Advanced Technology Research Laboratories, Sharp Corporation
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YOSHIOKA Fumiyoshi
Advanced Technology Research Laboratories, Sharp Corporation
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HASHIZUME Nobuo
Advanced Technology Research Laboratories, Sharp Corporation
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ADACHI Kouichirou
Central Research Laboratories, Sharp Corporation
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SUGIMOTO Kazuo
Central Research Laboratories, Sharp Corporation
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Hashizume N
Advanced Technology Research Laboratories Sharp Corporation
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Okumine Tetsuya
Advanced Technology Research Laboratories Sharp Corporation
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HAYASHIDA Shoichi
NTT Opto-electronics Laboratories
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Hamaguchi Chihiro
Faculty Of Engineering Osaka University
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Adachi K
Department Of Electrical And Information Engineering Faculty Of Engineering Yamagata University
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Hashizume Nobuo
Advanced Technology Research Laboratories Sharp Corporation
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Mitsuhashi K
Central Research Laboratories Sharp Corporation:(present Address)functional Devices Laboratories Sha
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Mitsuhashi Katsunori
Central Research Laboratories Sharp Corporation
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Nakano Akihiko
Analysis Center (ic) Group Sharp Corpotation
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Yoshioka Fumiyoshi
Advanced Technology Research Laboratories Sharp Corporation
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Sato Y
Kanagawa Univ. Yokohama
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Sato Yuichi
Central Research Laboratories Sharp Corporation
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OHTA Kenji
Advanced Technology Research Laboratories, Sharp Corporation
著作論文
- Influence of N_2O Oxynitridation on Interface Trap Generation in Surface-Channel p-Channel Metal Oxide Semiconductor Field Effect Transistors
- Influence of N_2O-Oxynitridation on Interface Trap Generation in Surface-Channel PMOSFETs
- Thickness Dependence of Furnace N_2O-Oxynitridation Effects on Breakdown of Thermal Oxides
- Novel Low Leakage and Low Resistance Titanium Salicide Technology with Recoil Nitrogen Achieved by Silicidation after Ion Implantation through Contamination-Restrained Oxygen Free LPCVD-Nitride Layer (SICRON)
- Study of an Elevated Drain Fabrication Method for Ultra-Shallow Junction
- Novel Ultra-Clean Self Aligned Silicide (Salicide) Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1μm Gate Electrode
- Advanced Trench and Local Oxidation of Silicon (LOCOS) Isolation Technology for Ultra-Low-Power Bulk Dynamic Threshold Metal Oxide Semiconductor Field Effect Transistor (B-DTMOS)
- Novel Oxygen Free Titaniurm Silicidation (OFS) Processing for Low Resistance and Thermally Stable SALICIDE (Self-Aligned Silicide) in Deep Submicron Dual Gate CMOS (Complementary Metal-Oxide Semiconductors)