Study of an Elevated Drain Fabrication Method for Ultra-Shallow Junction

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-30

著者

• Nakano Masayuki

  National Mito Hospital

• Ohta Kenji

  Advanced Technology Research Laboratories Sharp Corporation

• Kakimoto S

  Mitsubishi Electric Corp. Hyogo Jpn

• Kakimoto Seizo

  Advanced Technology Research Laboratories Sharp Corporation

• Ohta K

  Advanced Technology Research Laboratories Sharp Corporation

• NARA MASATO

  Shizuoka Prefectural Fisheries Experiment Station

• Nakano M

  Advanced Technology Research Laboratories Sharp Corporation

• NAKANO Masayuki

  Advanced Technology Research Laboratories, Sharp Corporation

• KOTAKI Hiroshi

  Advanced Technology Research Laboratories, Sharp Corporation

• SUGIMOTO Kazuo

  Advanced Technology Research Laboratories, Sharp Corporation

• OKUMINE Tetsuya

  Advanced Technology Research Laboratories, Sharp Corporation

• YOSHIOKA Fumiyoshi

  Advanced Technology Research Laboratories, Sharp Corporation

• HASHIZUME Nobuo

  Advanced Technology Research Laboratories, Sharp Corporation

• Sugimoto Kazuo

  Advanced Technology Research Laboratories Sharp Corporation

• Kotaki Hiroshi

  Advanced Technology Research Laboratories Sharp Corporation

• Nakano Masatake

  Thin Film Soi Group.process Engineering Dept.isobe R&d Shin-etsu Handotai Co. Ltd.

• Hashizume N

  Advanced Technology Research Laboratories Sharp Corporation

• Okumine Tetsuya

  Advanced Technology Research Laboratories Sharp Corporation

• Nakano M

  National Mito Hospital

• Hashizume Nobuo

  Advanced Technology Research Laboratories Sharp Corporation

• Yoshioka Fumiyoshi

  Advanced Technology Research Laboratories Sharp Corporation

• OHTA Kenji

  Advanced Technology Research Laboratories, Sharp Corporation

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