Novel Oxygen Free Titaniurm Silicidation (OFS) Processing for Low Resistance and Thermally Stable SALICIDE (Self-Aligned Silicide) in Deep Submicron Dual Gate CMOS (Complementary Metal-Oxide Semiconductors)
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-28
著者
-
Takagi Junkou
Central Research Laboratories, Sharp Corporation
-
KOTAKI Hiroshi
Central Research Laboratories, Sharp Corporation
-
NAKANO Masayuki
Central Research Laboratories, Sharp Corporation
-
HAYASHIDA Shigeki
Central Research Laboratories, Sharp Corporation
-
KAKIMOTO Seizou
Central Research Laboratories, Sharp Corporation
-
Kakimoto S
Mitsubishi Electric Corp. Hyogo Jpn
-
Kakimoto Seizo
Advanced Technology Research Laboratories Sharp Corporation
-
NARA MASATO
Shizuoka Prefectural Fisheries Experiment Station
-
MITSUHASHI Katsunori
Central Research Laboratories, Sharp Corporation
-
Takagi J
Sharp Corp. Nara Jpn
-
Takagi Junkou
Central Research Laboratories Sharp Corporation
-
Nakano M
Advanced Technology Research Laboratories Sharp Corporation
-
Sugimoto Kazuo
Advanced Technology Research Laboratories Sharp Corporation
-
Kotaki Hiroshi
Advanced Technology Research Laboratories Sharp Corporation
-
HAYASHIDA Shoichi
NTT Opto-electronics Laboratories
-
Nakano M
National Mito Hospital
-
Mitsuhashi K
Central Research Laboratories Sharp Corporation:(present Address)functional Devices Laboratories Sha
-
Mitsuhashi Katsunori
Central Research Laboratories Sharp Corporation
-
Nakano Masayuki
Central Research Laboratories Sharp Corporation
-
Hayashida S
Ntt Opto-electronics Laboratories
関連論文
- Lung-Specific DNA Damage Induced by Methylated Arsenics (Proceedings of the 16 th Symposium on Environmental Pollutants and Toxicology)
- Influence of N_2O Oxynitridation on Interface Trap Generation in Surface-Channel p-Channel Metal Oxide Semiconductor Field Effect Transistors
- Influence of N_2O-Oxynitridation on Interface Trap Generation in Surface-Channel PMOSFETs
- Thickness Dependence of Furnace N_2O-Oxynitridation Effects on Breakdown of Thermal Oxides
- Novel Low Leakage and Low Resistance Titanium Salicide Technology with Recoil Nitrogen Achieved by Silicidation after Ion Implantation through Contamination-Restrained Oxygen Free LPCVD-Nitride Layer (SICRON)
- Oral Administration on Dimethylarsinic Acid, a Main Metabolite of Inorganic Arsenic, in Mice Promotes Skin Tumorigenesis Initiated by Dimethylbenz(a)anthracene with or without Ultraviolet B as a Promoter
- 72-kDa Stress Protein (Hsp72) Induced by Administration of Dimethylarsinic Acid to Mice Accumulates in Alveolar Flat Cells of Lung, a Target Organ for Arsenic Carcinogenesis
- Cell-Nuclear Accumulation of 72-kDa Stress Protein Induced by Dimethylated Arsenics
- Cell-nuclear Accumulation of Stress Protein (Hsp72) Induced by Dimethylarsenics (Proceedings of the 20th Symposium on Toxicology and Environmental Health)
- Difference between Fresh-Water and Seawater Fishes in the Accumu lation of Environmental Chemical Pollutants
- Low Resistance and Thermally Stable Ti-Silicided Shallow Junction Formed by Advanced 2-Step Rapid Thermal Processing and Its Application to Deep Submicron Contact
- Enzymatic Synthesis of a Novel Trisaccharide, Glucosyl Lactoside
- MOCVD Growth of InP on 4-inch Si Substrate with GaAs Intermediate Layer
- Seeded Electron Beam Recrystallization of Large Area SOI Using Striped Tungsten Encapsulation Technique
- Elevated Polycide Source/Drain Shallow Junctions with Advanced Silicidation Processing and Al Plug/Collimated PVD (Physical Vapor Deposition)- Ti/TiN/Ti/Polycide Contact for Deep-Submicron Complementary Metal-Oxide Semiconductors
- Purification and Properties of a Novel Enzyme, Trehalose Synthase, from Pimelobacter sp.R48
- Power Durability of Al-W Alloy Electrodes Used in RF-Band Surface Acoustic Wave Filters
- The Power Durability of 900 MHz Band Double-Mode-Type Surface Acoustic Wave Filters and Improvement in Power Durability of Al-Cu Thin Film Electrodes by Cu Atom Segregation
- Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
- Study of an Elevated Drain Fabrication Method for Ultra-Shallow Junction
- Study of HF Defects in Thin, Bonded Silicon-on-Insulator Dependent on Original Wafers
- Epitaxial Growth of (Sr, Ba)Nb_2O_6 Thin Films by Pulsed Laser Deposition
- Study of HF Defects in Thin Bonded SOI Dependent on Original Wafers
- Novel Ultra-Clean Self Aligned Silicide (Salicide) Technology Using Double Titanium Deposited Silicide (DTD) Process for 0.1μm Gate Electrode
- Advanced Trench and Local Oxidation of Silicon (LOCOS) Isolation Technology for Ultra-Low-Power Bulk Dynamic Threshold Metal Oxide Semiconductor Field Effect Transistor (B-DTMOS)
- Fabrication and Characterization of (Sr, Ba)Nb_2O_6 Thin Films by Pulsed Laser Deposition
- Ba_Sr_TiO_3 Thin Film Production on Atomically Flat SrTiO_3(100)Substrates by a Pulsed Laser Deposition and Dielectric properties
- Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded Silicon on Insulator (SOI) Wafers
- Effective KOH Etching Prior to Modified Secco Etching for Analyzing Defects in Thin Bonded SOI Wafers
- Novel Oxygen Free Titaniurm Silicidation (OFS) Processing for Low Resistance and Thermally Stable SALICIDE (Self-Aligned Silicide) in Deep Submicron Dual Gate CMOS (Complementary Metal-Oxide Semiconductors)
- Low-Temperature-Fireable Dielectric Material Pb(Fe_W_)O_3-(Pb,Ca)(Fe_Nb_)O_3 for Microwave Use
- A Four-Band Hubbard Model for Doped CuO_5 and Related Clusters. Populations of Holes on Apex Oxygens Determined by the Full VB CI Method
- A Two-Band Hubbard Model for Clusters of Doped Copper Oxides and Other Metal Oxides: Populations of Holes and Spin Densities by the Full VB CI Method
- Extended Hubbard Models for Transition Metal Oxides and Halides: Importance of Spin and Charge Fluctuations in Charge Transfer Metals : Electrical Properties of Condensed Matter
- Difference between Fresh and Sea Water Fishes in the Accumulation of Environmental Chemical Pollutants. II Uptake and Elimination of Chlorobenzenes by Killifish (Oryzias latipes) (Proceedings of the 14th Symposium on Environmental Pollutants and Toxicolog
- Vibrational Overtone Absorption of Side Chain in Silicone at 1.55 μm Wavelength Band
- Digital Thermooptic Switch Formed Using Silicone Resin Waveguides
- Study of Ag Addition to YBa_2Cu_3O_ Films Prepared using Electrophoretic Deposition
- Existence of a Novel Enzyme Converting Maltose into Trehalose
- Fabrication of Ag-Doped Y_1Ba_2Cu_3O_ Superconducting Films on Cu Substrates by Electrophoretic Deposition
- Fabrication of Y-Ba-Cu-O Superconducting Films on Cu Substrates by an Electrophoretic Deposition Technique
- Magnetic Field Dependence of Voltage Noise in Y_1Ba_2Cu_3O_ Ceramic Superconductor Film
- Diffusion Barrier with Reactively Sputtered TiN for Thermally Stable Contact : Special Section : Solid State Devices and Materials 2 : Silicon Devices and Process Technologies
- Photochromic Evaporated Films of Spiropyrans with Long Alkyl Chains
- Silver Negative-Ion Implantation into Thermally Grown Thin SiO2 Film on Si Substrate and Heat Treatment for Formation of Silver Nanoparticles
- Novel Nonvolatile Random-Access Memory with Si Nanocrystals for Ultralow-Power Scheme
- Interconnection Technology for Three-Dimensional Integration
- Occurrence of Tetrodotoxin in a Starfish, Astropecten scoparius
- Interconnection Technology for Three-Dimensional Integration