Diffusion Barrier with Reactively Sputtered TiN for Thermally Stable Contact : Special Section : Solid State Devices and Materials 2 : Silicon Devices and Process Technologies
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-12-20
著者
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Yamazaki Osamu
大阪市立総合医療センター 肝臓内科
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KOBA Masayoshi
Central Research Laboratories, SHARP Corporation
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MITSUHASHI Katsunori
Central Research Laboratories, Sharp Corporation
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Yamazaki Osamu
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Yamazaki Osamu
Department Of Surgery Osaka City General Hospital
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Koba Masayoshi
Central Research Laboratories Sharp Corporation
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OHTAKE Koui
Central Research Laboratories, Sharp Corporation
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Ohtake Koui
Central Research Laboratories Sharp Corporation
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Yamazaki Osamu
Central Research Laboratories Sharp Corporation
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Mitsuhashi K
Central Research Laboratories Sharp Corporation:(present Address)functional Devices Laboratories Sha
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Mitsuhashi Katsunori
Central Research Laboratories Sharp Corporation
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