OHTA Kenji | Device Technology Research Laboratories, Sharp Corporation
スポンサーリンク
概要
関連著者
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NAKANO Masayuki
Device Technology Research Laboratories, Sharp Corporation
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KOTAKI Hiroshi
Device Technology Research Laboratories, Sharp Corporation
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OHTA Kenji
Device Technology Research Laboratories, Sharp Corporation
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SHINGUBARA Shoso
Graduate School of Advanced Sciences of Matter, Hiroshima University
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Nakano M
Advanced Technology Research Laboratories Sharp Corporation
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Shingubara Shoso
Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-4-4 Kagamiyama, Higashihiroshima-shi, Hiroshima 739-8527, Japan
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Shingubara Shoso
Graduate School of Advanced Science of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan
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Kotaki Hiroshi
Device Technology Research Laboratories, Sharp Corporation, 2613-1 Ichinomoto-cho, Tenri-shi, Nara 632-8567, Japan
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Nakano Masayuki
Device Technology Research Laboratories, Sharp Corporation, 2613-1 Ichinomoto-cho, Tenri-shi, Nara 632-8567, Japan
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Shingubara Shoso
Graduate School of Advanced Science of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8526, Japan
著作論文
- Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
- Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation