Shingubara Shoso | Graduate School of Advanced Science of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashi-Hiroshima 739-8530, Japan

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Formation of Al Dot Hexagonal Array on Si Using Anodic Oxidation and Selective Etching : Surfaces, Interfaoes, and Films
Adsorbed Water on a Silicon Wafer Surface Exposed to Atmosphere : Semiconductors
Study of a Dielectric Constant Due to Electronic Polarization Using a Semiempirical Molecular Orbital Method I : Semiconductors
Scanning Electron Microscope Observation of Heterogeneous Three-Dimensional Nanoparticle Arrays Using DNA : Surfaces, Interfaces, and Films
AgNO3-Dependent Morphological Change of Si Nanostructures Prepared by Single-Step Metal Assisted Etching Method
Thickness Dependences of Nucleation and Annihilation Fields of Magnetic Vortices in Submicron Supermalloy Dots
Highly Adhesive Electroless Cu Layer Formation Using an Ultra Thin Ionized Cluster Beam (ICB)-Pd Catalytic Layer for Sub-100 nm Cu Interconnections
Influence of Surface Oxide of Sputtered TaN on Displacement Plating of Cu
Computer-Aided Chemistry Estimation Method of Electronic-Polarization Dielectric Constants for the Molecular Design of Low-$k$ Materials
Contact Resistance Reduction Using Vacuum Loadlock System and Plasma Dry Cleaning
Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation
Formation and Evaluation of Electroless-Plated Barrier Films for High-Aspect-Ratio Through-Si Vias
Effect of Additives on Hole Filling Characteristics of Electroless Copper Plating

もっと見る

スポンサーリンク