Asymmetric Flux Generation and Its Relaxation in Reversed Field Pinch

スポンサーリンク

概要

• 論文の詳細を見る

• The toroidally asymmetric flux enhancement ("dynamo effect") and theaxisymmetrization of the enhanced fluxes that follows in the setting up phaseof Reversed Field Pinch are investigated on the STP-3(M) device. A rapid in-crease in the toroidal flux generated by the dynamo effect is first observed nearthe poloidal and toroidal current feeders. Then, this inhomogeneity of the fluxpropagates toroidally towards the plasma current. The axisymmetrization ofthe flux is attained just after the maximum of plasma current. The MHD activitiesdecrease significantly after this axisymmetrization and the quiescent period isobtained.

• 社団法人日本物理学会の論文
• 1985-04-15

著者

• Sato Koichi

  Department Of Energy Engineering And Science Nagoya University

• Sato Ko-ichi

  Plasma Science Center Nagoya University

• Shindo H

  Department Of Electronics Faculty Of Engineering Hiroshima University

• ARIMOTO Hideki

  Institute of Plasma Physics,Nagoya University

• MASAMUNE Sadao

  Institute of Plasma Physics,Nagoya University

• NAGATA Akiyoshi

  Institute of Plasma Physics,Nagoya University

• OGAWA Kiyoshi

  Institute of Plasma Physics,Nagoya University

• YAMADA Shuichi

  Institute of Plasma Physics,Nagoya University

• MATSUOKA Akio

  Institute of Plasma Physics,Nagoya University

• SHINDO Haruo

  Institute of Plasma Physics,Nagoya University

• OSHIYAMA Hiroshi

  Institute of Plasma Physics,Nagoya University

• TAMARU Takeshi

  Institute of Plasma Physics,Nagoya University

• SATO Koichi

  Institute of Plasma Physics,Nagoya University

• Masamune Sadao

  Institute Of Plasma Physics Nagoya University:department Of Electrical Engineering Kyoto Institute O

• OGAWA Kiyoshi

  Musashi Institute of Technology

• Yamada S

  Institute Of Plasma Physics Nagoya University

• TSUKISHIMA Takashige

  Department of Electronics, Aichi Institute of Technology

• MATSUOKA Akio

  Department of Electrical Engineering, Gunma University

• Yamada Shuichi

  Institute Of Plasma Physics Nagoya University

• Oshiyama Hiroshi

  Department Of Electronics And Information Science Kyoto Institute Of Technology

• Tsukishima Takashige

  Department Of Electronics Aichi Institute Of Technology

• Tsukishima Takashige

  Department Of Electrical Engineering School Of Engineering Nagoya University

• Tsukishima Takashige

  Faculty Of Engineering Nagoya Unibersity

• Ogawa K

  Tokyo Institute Of Technology

• Yamada S

  Institute Of Materials Science University Of Tsukuba:(present)center For Tsukuba Advansed Research A

• Matsuoka A

  Department Of Electrical Engineering Faculty Of Science And Engineering Tokyo Science University

• Tamaru Takeshi

  Department Of Electronics Faculty Of Engineering Hiroshima University

• Tsukishima T

  Department Of Electronics Aichi Institute Of Technology

• Nagata Akiyoshi

  Institute Of Plasma Physics Nagoya University

• Matsuoka A

  Department Of Electrical Engineering Gunma University

• Nakamura A

  Graduate School Of Life And Environmental Sciences University Of Tsukuba

• Ogawa Kiyoshi

  Institute For Life Science Research Asahi Chemical Industry Co. Ltd.

• Arimoto Hideo

  Department of Energy Engineering and Science, Nagoya University

• Yamada Shigeru

  Institute of Materials Science, University of Tsukuba:(Present)Center for Tsukuba Advansed Research Alliance,University of Tsukuba

関連論文

• 23pGT-6 層状有機超伝導体β-(BDA-TTP)_2SbF_6におけるジョセフソン磁束フロー抵抗(23pGT 若手奨励賞講演・β型他,領域7(分子性固体・有機導体))
• 26pWB-9 擬2次元有機超伝導体(ET)_2Cu(NCS)_2のジョセフソン磁束フロー抵抗における四回対称性(κ-ET系,領域7,分子性固体・有機導体)
• 棒状分子が作る高い対称性をもつ液晶性超構造の構造解析
• 27pVC-13 ジシクロヘキシルメタノールの過冷却液体における熱異常(27pVC 領域12,領域11合同セッション(ガラス転移・液体転移),領域12(ソフトマター物理,化学物理,生物物理))
• 27aVB-2 直流電場下におけるネマチック液晶の欠陥ダイナミクス(27aVB 液晶,領域12(ソフトマター物理,化学物理,生物物理))
• 第44回熱測定討論会報告
• 22aWE-1 リオトロピック液晶のラメラ相における脂質分子のアルキル鎖の運動についての熱力学的考察(22aWE 液晶,領域12(ソフトマター物理,化学物理,生物物理))
• 25pYC-7 異方性の大きな粒子が作る立方対称周期構造の可能性(液晶・界面,領域12,ソフトマター物理,化学物理,生物物理)
• 21aRL-10 BABHのIm3m相における分子凝集構造解析の試み(液晶,領域12,ソフトマター物理,化学物理,生物物理)
• 23pTH-11 Ba_IV_(IV=Si.Ge)の電子物性に与えるフォノンの影響(クラスレート・新物質,領域7,分子性固体・有機導体)
• サーモトロピック液晶における双連結構造
• PE02 キュービック液晶形成化合物ACBC-16の赤外吸収スペクトルによる研究(トピカルセッション-液晶物性計測の最前線-, 2005年日本液晶学会討論会)
• 1C04 BABH-n同族体の2つのキュービック相(トピカルセッション-液晶材料の新しい機能開発-, 2005年日本液晶学会討論会)
• 20aXA-7 Ba_IV_(IV=Si,Ge)クラスレート化合物のフォノンの異常(クラストレート,領域7(分子性固体・有機導体))
• 27pYK-4 Ni_2(n-BuCS_2)_4Iの熱容量(金属鎖(MMX, MXなど),領域7(分子性固体・有機導体))
• 25aYK-6 Ba_Si_の物性に与えるラットリングの影響(クラストレート,領域7(分子性固体・有機導体))
• サーモトロピック液晶とリオトロピック液晶--統一的視点の可能性
• 大学における熱測定教育の意義と実験教材 (特集 熱力学・熱測定と教育)
• PB19 ACBC-16のキュービック相の構造(2004年日本液晶学会討論会)
• 3A05 全フッ素置換鎖を有するポリカテナーメソゲン14PCFの相挙動と熱容量(2004年日本液晶学会討論会)
• 15aWE-6 Ba_Si_ 超伝導体の比熱(クラスレート・ゼオライト, 領域 7)
• 第37回熱測定討論会
• Study of Strain and Giant Magnetoresistance of Co/Cu Magnetic Multilayers(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
• Effect of Pressure on the Giant Magnetoresistance in Co/Cu Magnetic Multilayers(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
• 20aXE-9 有機超伝導体 (MDT-TTF)_2(AuI_2) と (MDT-TSF)(AuI_2)_ の低温熱容量特性
• Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
• Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
• Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
• Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
• Production of Large-Diameter Microwave Plasma with a High-Permittivity Material Window
• 2A05 キュービック液晶BABH(n)の圧力下の相転移現象(物理・物性)
• ac Calorimetry and EPR Study on Metal-Insulator Transition and Glass Transition in an Organic Conductor with Double-Column Structure, (DIMET)_2BF_4 : Condensed Matter: Electronic Properties, etc.
• 1A07 BABH-n同族体のキュービック相の構造(2004年日本液晶学会討論会)
• Negative Ion Assisted Silicon Oxidation in Downstream of Microwave Plasma
• Measurement of Fluorocarbon Radicals Generated from C_4F_8/H_2 Inductively Coupled Plasma : Study on SiO_2 Selective Etching Kinetics
• RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma
• Microloading Effect in Highty Selective Si0_2 Contact Hole Etching Employing Inductively Coupled Plasma
• Effect of Magnetic Field to Etching Characteristics of Inductively Coupled Plasma ( Plasma Processing)
• High Rate and Highly Selective SiO_2 Etching Employing Inductively Coupled Plasma
• RF Self-Bias Characteristics in Inductively Coupled Plasma
• Al Etching Characteristics Ernploying Helicon Wave Plasma
• Si Etching Employing Steady-State Magnetron Plasma with Magnet at Anode Centered in a Cylindrical Reactor
• Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet : Etching
• Compact Electron Cyclotron Resonance Plasma-Etching Reactor Employing Permanent Magnet
• Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
• High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields : Etching and Deposition Technology
• High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields
• 30aWL-8 Pt_2(n-PrCS_2)_4,Pt_2(n-PrCS_2)_4I_2およびPt_2(n-PrCS_2)_4Iの熱容量(M(M)X鎖・プロトン伝導)(領域7)
• 第43回熱測定ワークショップ報告
• 2A06 異なる構造を持つキュービック液晶相の熱容量(物理・物性)
• 22aZB-1 ANBC (22) の二つのキュービック相の熱容量
• Enhancement of Negative-Ion-Assisted Silicon Oxidation by Radio-Frequency Bias
• 3C13 等方性液晶ACBC(16)の熱容量(物理・物性)
• Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
• Highly Selective SiO_2/Si Etching and Related Kinetics in Time-Modulated Helicon Wave Plasma
• SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
• Kinetic Treatment of Self-Reversal in Reversed Field Pinch Plasma
• Asymmetric Flux Generation and Its Relaxation in Reversed Field Pinch
• 4th International Symposium on the New Frontiers of Thermal Studies of Materials
• 21aXE-11 κ-(BEDT-TTF)_4Hg_X_8 (X=Br, Cl) の低温熱容量測定
• Study on Action Mode of Sphingosine 1-Phosphate in Rat Hepatocytes
• 27pYR-13 負の熱膨張を示すZrW_2O_8の熱容量と相転移
• Effect of Plasma Biasing on Suppression of Electrostatic Fluctuation in the Edge Region of STP-3(M) Reversed Field Pinch(Gases, Plasmas and Electric Discharges)
• Contribution of the Electrostatic Fluctuation to the Particle and Energy Fluxes in the Edge Region of STP-3 (M) Reversed Field Pinch Plasma (Gases, Plasmas and Electric Discharges)
• Superthermal Electron Diffusion Processes in a Reversed Field Pinch
• Far-Infrared Laser Interferometry Measurements on the STP-3(M) Reversed-Field Pinch
• New Features of the Reversed-Field Pinch Dynamo
• Coupling of Tearing Modes in Normal RFP Discharge
• Monte Carlo Studies of Transport in a Reversed Field Pinch
• Observation of m=0 Structure with Streak Picture in a Reversed Field Pinch Having Large Magnetic Reynolds Number
• A 3-D Resistive MHD Simulation Analysis of Field Reversal Control in the Reversed Field Pinch
• The Measurement of Soft X-Rays from the STP-3(M) Reversed-Field Pinch Plasma
• Self-Organization and Plasma Dynamo in a Reversed Field Pinch
• Enhancement of Impurity Influx Due to the Dynamo Action in RFP Plasma
• Behavior of the Peripheral Plasma in Reversed Field Pinch
• Mechanism of activation of proximate mutagens in Ames tester strains: The acetyl-CoA dependent enzyme in Salmonella typhimurium TA98 deficient in TA98/1, 8-DNP_6 catalyzed DNA-binding as the cause of mutagenicity
• 28aWF-11 重い電子系 Ce_2CoIn_8 の超伝導
• 29aYC-7 サーモトロピック等方性液晶相の熱容量
• 3C14 サーモトロピック等方性液晶の構造について(物理・物性)
• COMPARISON OF HUMIC ACIDS FROM CHARRED RESIDUES OF SUSUKI (EULALIA, Miscanthus sinensis A.) AND FROM THE A HORIZONS OF VOLCANIC ASH SOILS
• HUMUS COMPOSITION OF CHARRED PLANT RESIDUES
• Parity Effect in the Resonant Tunneling
• Electron Energy Control in Inductively Coupled Plasma Employing Multimode Antenna
• Thin Film Detection Employing Frequency Shift in Sheath Current Oscillation
• Sphingosylphosphorylcholine Antagonizes Proton-Sensing Ovarian Cancer G-Protein-Coupled Receptor 1 (OGR1)-Mediated Inositol Phosphate Production and cAMP Accumulation
• Enhancement of Sphingosine 1-Phosphate-Induced Phospholipase C Activation During G_0-G_1 Transition in Rat Hepatocytes
• Sphingosine 1-Phosphate Stimulates Insulin Secretion in HIT-T 15 Cells and Mouse lslets
• 温度上昇で収縮するセラミックス
• Anti-atherogenic Actions of High-density Lipoprotein through Sphingosine 1-Phosphate Receptors and Scavenger Receptor Class B Type I
• 温度上昇で収縮するセラミックス
• 広い温度範囲で熱収縮を示す負の熱膨張材料 (特集 セラミックスの熱膨張特性)
• 第38回熱測定討論会
• 大学における熱測定教育の意義と実験教材
• 硝酸カリウムの相関係の熱分析
• 広い温度範囲で熱収縮を示す負の熱膨張材料
• 29aPS-16 7CB/n-heptane二成分系の液晶相における誘電緩和(29aPS 領域12ポスターセッション,領域12(ソフトマター物理,化学物理,生物物理))
• 28pXC-5 脂質膜の融合に際する水の協同性(28pXC 膜・ミセル,領域12(ソフトマター物理,化学物理,生物物理))
• PB44 nTCB-パラフィン二成分系における膨潤SmE相のX線回折(ソフトマター,ポスター発表,2012年日本液晶学会討論会)
• 28aPS-137 ネマチック液晶における転傾の有効質量 : 緩和過程における慣性運動の観察(領域12ポスターセッション,領域12(ソフトマター物理,化学物理,生物物理))
• 28aPS-135 添加塩のイオン種に依存した中性リン脂質の膜間相互作用の変化(領域12ポスターセッション,領域12(ソフトマター物理,化学物理,生物物理))

もっと見る 閉じる

スポンサーリンク