Comparison of Deposition Characteristics between Triethyl and Trimethyl Borates in an Atmospheric Pressure Chemical Vapor Deposition Equipment with Tetraethyl Orthosilicate and O_3

スポンサーリンク

概要

著者

関連論文

Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
Surface Wave Plasma Production Employing High Permittivity Material for Microwave Window : Nuclear Science, Plasmas, and Electric Discharges
Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
Oxygen Microwave Plasma Density Enhancement by Surface Waves with a High-Permittivity Material Window
Effects of Nitrogen Addition to Microwave Oxygen Plasma in Surface Wave with Disk-Plate Window and Photoresist Ashing
A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces
Comparison of Deposition Characteristics between Triethyl and Trimethyl Borates in an Atmospheric Pressure Chemical Vapor Deposition Equipment with Tetraethyl Orthosilicate and O_3
A Generalized Model for Resolution-Dependent Roughness Measured by an Optical Profiler for Optical Surfaces
A Model for Resolution Dependent Roughness Values Measured by an Optical Profiler for Specific Surfaces

スポンサーリンク