Effects of Nitrogen Addition to Microwave Oxygen Plasma in Surface Wave with Disk-Plate Window and Photoresist Ashing
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-10-15
著者
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ZAIMA Shigeaki
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
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Furukawa M
Canon Sales Co. Ltd. Tokyo Jpn
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Furukawa M
Process Equipment Engineering Div. Canon Sales Co. Inc.:(present)utsunomiya Optical Products Operati
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Furukawa Masakazu
Semiconductor Engineering Laboratory Pioneer Electronics Co.
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YAMAMOTO Jin
Process Equipment Engineering Div., Canon Sales Co., Inc.
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SHINAGAWA Keisuke
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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OHGAWARA Shoji
Process Equipment Engineering Div., Canon Sales Co., Inc.
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FURUKAWA Masakazu
Aries Research Group
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Shinagawa K
Canon Sales Co. Inc. Tokyo Jpn
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Shinagawa Keisuke
Process Equipment Engineering Div. Canon Sales Co. Inc.
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Yamamoto J
Process Equipment Engineering Div. Canon Sales Co. Inc.
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Ohgawara Shoji
Process Equipment Engineering Div. Canon Sales Co. Inc.
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Zaima Shigeaki
Center For Cooperative Research In Advanced Science & Technology Nagoya University
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