Hydrogen Effects on Si_<1-x>Ge_x/Si Heteroepitaxial Growth by Si_2H_6- and GeH_4-Source Molecular Beam Epitaxy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-12-30

著者

• Yasuda Y

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Yasuda Yukio

  Department Of Applied Physics Osaka City University

• OGAWA Masaki

  EcoTopia Science Institute, Nagoya University

• ZAIMA Shigeaki

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• IKEDA Hiroya

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• Ikeda Hiroya

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Ogawa Masaki

  Ecotopia Science Institute Nagoya University

• Okada M

  Nagoya Univ. Nagoya Jpn

• OKADA Masahisa

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• KONDO Masaaki

  Department of Crystalline Materials Science, School of Engineering, Nagoya University

• Okada Masahisa

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Yasuda Yukio

  Shionogi Research Laboratories Shionogi & Co. Ltd.

• Zaima Shigeaki

  Center For Cooperative Research In Advanced Science & Technology Nagoya University

• Okada M

  Faculty Of Science And Engineering Ritsumeikan University

• Kondo Masaaki

  Department Of Crystalline Materials Science School Of Engineering Nagoya University

• Yasuda Yukio

  Department Of Applied Physics Faculty Of Engineering Nagoya University

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