Local Leakage Current of HfO_2 Thin Films Characterized by Conducting Atomic Force Microscopy
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-04-30
著者
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Yasuda Yukio
Department Of Applied Physics Osaka City University
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SAKAI Akira
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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SAKASHITA Mitsuo
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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ZAIMA Shigeaki
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
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IKEDA Hiroya
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Sakai A
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Ikeda Hiroya
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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GOTO Tomokazu
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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