Atomic Scale Characterization of Nitridation Process on Si(100)-2x1 Surfaces by Radical Nitrogen
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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Yasuda Y
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Yasuda Yukio
Department Of Applied Physics Osaka City University
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SAKAI Akira
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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ZAIMA Shigeaki
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
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IKEDA Hiroya
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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MATSUSHITA Daisuke
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Matsushita Daisuke
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Matsushita Daisuke
Department Of Architecture And Architectural Engineering Graduate School Of Engineering Kyoto Univer
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Matsushita Daisuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Ikeda Hiroya
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Yasuda Yukio
Shionogi Research Laboratories Shionogi & Co. Ltd.
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Zaima Shigeaki
Center For Cooperative Research In Advanced Science & Technology Nagoya University
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Yasuda Yukio
Department Of Applied Physics Faculty Of Engineering Nagoya University
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Sakai Akira
Department Of Agricultural Chemistry The University Of Tokyo
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