Hydrogen Effects on Heteroepitaxial Growth of Ge Films on Si(111) Surfaces by Solid Phase Epitaxy

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-12-30

著者

• Yasuda Y

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Yasuda Yukio

  Department Of Applied Physics Osaka City University

• OGAWA Masaki

  EcoTopia Science Institute, Nagoya University

• ZAIMA Shigeaki

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• IKEDA Hiroya

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• Ikeda Hiroya

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Ogawa Masaki

  Ecotopia Science Institute Nagoya University

• Okada M

  Nagoya Univ. Nagoya Jpn

• OKADA Masahisa

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• MUTO Akiyoshi

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• SUZUMURA Isao

  Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University

• Okada Masahisa

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Yasuda Yukio

  Shionogi Research Laboratories Shionogi & Co. Ltd.

• Suzumura Isao

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Muto Akiyoshi

  Research Department 1 Semiconductor Leading Edge Technologies Inc. (selete)

• Muto Akiyoshi

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Zaima Shigeaki

  Center For Cooperative Research In Advanced Science & Technology Nagoya University

• Okada M

  Faculty Of Science And Engineering Ritsumeikan University

• Yasuda Yukio

  Department Of Applied Physics Faculty Of Engineering Nagoya University

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