Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-04-30

著者

• SAKAI Akira

  Graduate School of Engineering, Nagoya University

• YASUDA Yukio

  Graduate School of Engineering, Nagoya University

• TAKAHASHI Ryoya

  Graduate School of Engineering, Nagoya University

• SAKASHITA Mitsuo

  Graduate School of Engineering, Nagoya University

• ZAIMA Shigeaki

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• NAKATSUKA Osamu

  Center for Integrated Research in Science and Engineering, Nagoya University

• IKEDA Hiroya

  Graduate School of Engineering, Nagoya University

• Sakai A

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Ikeda Hiroya

  Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University

• Nakatsuka Osamu

  Center For Integrated Research In Science And Engineering Nagoya University

• KOBAYASHI Yasushi

  Graduate School of Engineering, Nagoya University

• Takahashi Ryoya

  Graduate School Of Engineering Nagoya University

• Kobayashi Y

  Graduate School Of Engineering Nagoya University

関連論文

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