The Photopolymer Science and Technology Award

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関連論文

Ashing Properties in a Surface-Wave Mode Plasma with a Quartz Window
Ashing Properties in a Surface-Wave Mode Plasma with a High-Permittivity Alumina Window : Semiconductors
Effects of Nitrogen Addition to Microwave Oxygen Plasma in Surface Wave with Disk-Plate Window and Photoresist Ashing
Nanofabrication with a Novel EB System with a Large and Stable Beam Current
Band-Gap Energy and Effecive Mass of BGaN
Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
Dependence of Crystal Quality on Residual Strain in Strain-Controlled Thin AlN Layer Grown by Metalorganic Vapor Phase Epitaxy
The Photopolymer Science and Technology Award
Effect of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below
Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems
Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
Atomic Layer Controlled Digital Etching of Silicon : Etching and Deposition Technology
Atomic Layer Controlled Digital Etching of Silicon
Anomalous Hydrodynamic Behavior of Smectic Liquid Crystals at Low Frequencies
Apparatus for Measurement of Complex Shear Modulus of Liquid Crystals at Low Frequencies : Physical Acoustics
A Novel Optical Lithography Technique Using the Phase-Shifter Fringe
Sub-Halfmicron Lithography Using a High-Contrast i-Line CEL

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