A Novel Optical Lithography Technique Using the Phase-Shifter Fringe
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-05-15
著者
-
Hasegawa Norio
Department Of Urology Jikei University School Of Medicine
-
Hayashi Norihiro
Department Of Urology Jikei University School Of Medicine
-
Hasegawa N
Hitachi Ltd. Tokyo Jpn
-
Hasegawa N
Univ. Tokyo Tokyo Jpn
-
Hasegawa Norio
Department Of Material Physics Faculty Of Engineering Science Osaka University
-
Okazaki S
Japan Broadcasting Corp. Tokyo Jpn
-
Terasawa T
Hitachi Ltd. Tokyo Jpn
-
TANAKA Toshihiko
Hitachi Limited, Central Research Laboratory
-
UCHINO Shouichi
Hitachi Limited, Central Research Laboratory
-
HASEGAWA Norio
Hitachi Limited, Central Research Laboratory
-
YAMANAKA Toshiaki
Hitachi Limited, Central Research Laboratory
-
TERASAWA Tsuneo
Hitachi Limited, Central Research Laboratory
-
OKAZAKI Shinji
Hitachi Limited, Central Research Laboratory
-
Uchino S
Central Research Lab. Hitachi Ltd.
-
Yamanaka Toshiaki
Hitachi Limited Central Research Laboratory
関連論文
- Growth Characteristics and Dense Culture of a Thermophilic Cyanobacterium, Chroococcidiopsis sp. Strain TS-821
- Formations of D^- Complexes and D^- Band in Germanium
- Extracorporeal shock wave treatment for Peyronie's disease using EDAP LT-02 ; preliminary results
- Diagnosis of pheochromocytoma using [^I]- compared with [^I]-metaiodobenzylguanidine scintigraphy
- Nanofabrication with a Novel EB System with a Large and Stable Beam Current
- Patterns of failure and influence of potential prognostic factors after surgery in transitional cell carcinoma of the upper urinary tract
- Effect of Basic Additives on Acid-Catalyzed Electron-Beam Negative Resist Using Intramolecular Dehydration of Phenylcarbinol
- The Photopolymer Science and Technology Award
- Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems
- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
- Novel Process for Direct Delineation of Spin on Glass (SOG)
- Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
- Formation of Fractionated Novolak Resin Langmuir-Blodgett Films
- Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices : Micro/nanofabrication and Devices
- Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices
- Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations
- Investigation of Resist Pattern Deformation in Chemical Amplification Resists on SiN_x Substrates
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs : Lithography Technology
- Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs
- Identification and Characterization of Phycobiliprotein from a Thermophilic Cyanobacterium, Chroococcidiopsis sp. Strain TS-821
- Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design
- Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics
- 0.13 μm Pattern Delineation Using KrF Excimer Laser Light
- Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
- Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
- A Novel Optical Lithography Technique Using the Phase-Shifter Fringe
- Proposal for the Coma Aberration Dependent Overlay Error Compensation Technology
- Sub-Halfmicron Lithography Using a High-Contrast i-Line CEL
- Transient receptor potential A1 receptor-mediated neural cross-talk and afferent sensitization induced by oxidative stress : Implication for the pathogenesis of interstitial cystitis/bladder pain syndrome