Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• TERASAWA Tsuneo

  Central Research Laboratory, Hitachi, Ltd.

• Fukuda Hiroshi

  Central Research Laboratory Hitachi Ltd.

• Fukuda Hiroshi

  Central Research Labolatory Hitachi Ltd.

• Fukuda H

  Hitachi Ltd. Kokubunji Jpn

• HASEGAWA Norio

  Central Research Laboratory, Hitachi, Ltd.

• KATAGIRI Souichi

  Central Research Laboratory, Hitachi, Ltd.

• Hasegawa N

  Univ. Tokyo Tokyo Jpn

• Terasawa T

  Hitachi Ltd. Tokyo Jpn

• Terasawa Tsuneo

  Central Research Laboratory Hitachi Ltd.

• Hasegawa Norio

  Central Research Laboratory Hitachi Ltd.

• Katagiri Souichi

  Central Research Laboratory Hitachi Ltd.

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