Prospects for Optical-, EB-, and X-Ray Lithography for Giga-Bit Memory : Advantages and Disadvantages
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Fukuda Hiroshi
Central Research Laboratory Hitachi Ltd.
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Fukuda Hiroshi
Central Research Labolatory Hitachi Ltd.
関連論文
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
- Novel Process for Direct Delineation of Spin on Glass (SOG)
- Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
- A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
- Prospects for Optical-, EB-, and X-Ray Lithography for Giga-Bit Memory : Advantages and Disadvantages
- Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
- Direct Patterning of Spin-on-Glass Materials by ArF Excimer Laser Irradiation and Their New Application to Hard-mask Processes
- Novel Process for Direct Delineation of Spin on Glass (SOG) : Resist Material and Process
- A New Pupil Filter for Annular Illumination in Optical Lithography
- Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography
- Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
- Phase Retrieval from Defocused Images and Its Applications in Lithography
- Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
- Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
- A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
- Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
- Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography : Photolithography