Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
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概要
- 論文の詳細を見る
Recently, we have investigated the effects of radially non-symmetric pupil filters and multiple-pupil exposure sequences in optical lithography [to appear in: Proc. SPIE 2726 (1996)]. Based on numerical simulations we predicted that extremely narrow lines could be delineated using the superposition of exposures with symmetric and anti-symmetric pupil functions. Here, we present experimental results verifying this prediction. Using conventional masks and a pupil filtering i-line stepper with a numerical aperture of 0.4, we were able to achieve linewidths of 0.18 μm in 1.0 μm thick positive photoresist, with a depth of focus of 1μm.
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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Fukuda Hiroshi
Central Research Labolatory Hitachi Ltd.
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Von Buenau
Central Research Laboratory Hitachi Ltd.
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Von Bunau
Central Research Laboratory Hitachi Ltd.:(present) Carl Zeiss Lithos Gmbh)
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- Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
- Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography : Photolithography