Fukuda Hiroshi | Central Research Labolatory Hitachi Ltd.

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概要

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著作論文

Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
Novel Process for Direct Delineation of Spin on Glass (SOG)
Prospects for Optical-, EB-, and X-Ray Lithography for Giga-Bit Memory : Advantages and Disadvantages
Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
Direct Patterning of Spin-on-Glass Materials by ArF Excimer Laser Irradiation and Their New Application to Hard-mask Processes
Novel Process for Direct Delineation of Spin on Glass (SOG) : Resist Material and Process
A New Pupil Filter for Annular Illumination in Optical Lithography
Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography
Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
Phase Retrieval from Defocused Images and Its Applications in Lithography
Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography : Photolithography

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