Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process

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Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
Novel Process for Direct Delineation of Spin on Glass (SOG)
Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
Formation of Fractionated Novolak Resin Langmuir-Blodgett Films
Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices : Micro/nanofabrication and Devices
Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices
0.13 μm Pattern Delineation Using KrF Excimer Laser Light
Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
Prospects for Optical-, EB-, and X-Ray Lithography for Giga-Bit Memory : Advantages and Disadvantages
Dark-Field Phase Shifter Edge Mask for Actual Logic Gate Patterns
Direct Patterning of Spin-on-Glass Materials by ArF Excimer Laser Irradiation and Their New Application to Hard-mask Processes
EB call projection Lithography : Lithography Technology
Electron Beam Mask Fabrication for MOSLSI's with 1.5 μm Design Rule : A-1: ADVANCED LITHOGRAPHY AND PROCESS
Electron Beam Enhanced Surface Photovoltage
Fabrication of Deep Sub-μm Narrow-Channel Si-MOSFET's with Twofold-Gate Structures : Microfabrication and Physics
A Novel Probe Size Measurement Method for a Fine Electron Beam : Inspection and Testing
Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2 μm Lines
Novel Process for Direct Delineation of Spin on Glass (SOG) : Resist Material and Process
A New Pupil Filter for Annular Illumination in Optical Lithography
Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography
A Novel Probe Size Measurement Method for a Fine Electron Beam
Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
Phase Retrieval from Defocused Images and Its Applications in Lithography
Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens
Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2μm Lines : Electron Beam Lithography
Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
A Detection Method for a T-Topped Profile in Resist Patterns by Top-Down-View Critical Dimension Scanning Electron Microscope
Primting Isolated Features with k_1 = 0.2 Using Multiple-Pupil Exposure
Axial Image Superposing (Super-FLEX) Effect Using the Mask Modulation Method for Optical Lithography : Photolithography
Fabrication of Deep Sub-$\mu$m Narrow-Channe1 Si-MOSFET's with Twofold-Gate Structures

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